ULPMAT

Aluminum Fluoride / Magnesium Fluoride

Chemical Name:
Aluminum Fluoride / Magnesium Fluoride
Formula:
AlF3/MgF2
Product No.:
1309120900
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
1309120900ST001 AlF3/MgF2 99.9% Ø 101.6mm x 3.175mm Inquire
1309120900ST002 AlF3/MgF2 99.9% Ø 101.6mm x 6.35mm Inquire
Product ID
1309120900ST001
Formula
AlF3/MgF2
Purity
99.9%
Dimension
Ø 101.6mm x 3.175mm
Product ID
1309120900ST002
Formula
AlF3/MgF2
Purity
99.9%
Dimension
Ø 101.6mm x 6.35mm

Aluminum Magnesium Fluoride sputtering target Overview

Aluminum Magnesium Fluoride sputtering target is a high-performance fluoride-based composite target engineered for optical coatings, antireflective layers, and protective films in the vacuum deposition industry. Combining the excellent UV transparency and chemical resistance of MgF₂ with the superior film uniformity and etch resistance of AlF₃, this composite target enables precise control over refractive index, film morphology, and adhesion in multilayer thin-film stacks.

Our Aluminum Fluoride / Magnesium Fluoride targets are fabricated using hot pressing, vacuum sintering, or cold isostatic pressing (CIP) methods to ensure high density, homogeneity, and strong mechanical stability. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.

Product Highlights

  • High Purity: ≥99.9%, ensuring excellent film quality and optical performance.
  • Superior Film Properties: Produces uniform, high-transparency coatings with strong adhesion.
  • Customizable Specifications: Available in various sizes, shapes, and compositions to meet specific equipment requirements.
  • Low Impurity Content: Ideal for optical coatings, display technologies, laser systems, and advanced electronics.

Applications of Aluminum Magnesium Fluoride Sputtering Targets

Optical Coatings: Used for antireflective, dielectric mirror, and beam-splitting layers in UV–IR optics
Photonic Devices: Fabrication of low-loss waveguides and filters
Display Technologies: Coatings for LCD/LED/OLED displays
Protective Layers: Transparent hard coatings for sensors and optical windows
UV and Vacuum UV (VUV) Optics: Fluoride layers suitable for deep-UV systems

Reports

Each target is delivered with a Certificate of Analysis (COA) verifying purity, composition ratio, density, and dimension. Additional inspections, including XRD phase analysis, SEM imaging, and sputtering uniformity tests, are available upon request.

Why Choose Us?

As a reliable aluminum magnesium fluoride sputtering target supplier, we deliver high-purity AlF3-MgF2 targets with excellent density, low impurity content, and stable sputtering performance. Our products are engineered for optical coatings, laser systems, and advanced electronics, ensuring uniform films and superior adhesion. With customizable dimensions, strict quality control, and global, compliant delivery, we provide a consistent and dependable supply for your critical thin-film deposition processes.

Chemical Formula: AlF₃-MgF₂
Appearance White to off-white ceramic composite
Purity ≥99.9% for each component
Target Shape Planar, circular, rectangular, or custom
Density ~3.0–3.2 g/cm³ (depending on ratio)
Melting Point Composite: no sharp melting point (sintered)
Bonding Service Available with backing plate (e.g., Cu, Mo)

Not classified as hazardous

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

SKU 1309120900ST Category Tags: Brand:

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded