ULPMAT

Aluminum Copper Alloy

Chemical Name:
Aluminum Copper Alloy
Formula:
AlCu
Product No.:
132900
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
132900ST001 AlCu 99.99% Ø 101.4 mm x 6mm Inquire
132900ST002 AlCu 99.99% Ø 101.4 mm x 6mm Inquire
132900ST003 AlCu 99.99% Ø 101.6 mm x 5mm Inquire
132900ST004 AlCu 99.999% 127 mm x 457.2 mm x 6mm Inquire
132900ST005 AlCu 99.999% 127 mm x 457.2 mm x 6mm Inquire
132900ST006 AlCu 99.99% 1500 mm x 125 mm x 10mm Inquire
Product ID
132900ST001
Formula
AlCu
Purity
99.99%
Dimension
Ø 101.4 mm x 6mm
Product ID
132900ST002
Formula
AlCu
Purity
99.99%
Dimension
Ø 101.4 mm x 6mm
Product ID
132900ST003
Formula
AlCu
Purity
99.99%
Dimension
Ø 101.6 mm x 5mm
Product ID
132900ST004
Formula
AlCu
Purity
99.999%
Dimension
127 mm x 457.2 mm x 6mm
Product ID
132900ST005
Formula
AlCu
Purity
99.999%
Dimension
127 mm x 457.2 mm x 6mm
Product ID
132900ST006
Formula
AlCu
Purity
99.99%
Dimension
1500 mm x 125 mm x 10mm

Aluminum Copper Alloy Overview

Aluminum Copper Alloy sputtering targets are high-performance composite materials engineered for thin-film deposition processes that require enhanced electrical conductivity, mechanical strength, and thermal stability. We offer customizable compositions and sizes to meet specific needs, along with comprehensive after-sales support—please feel free to contact us if you have any questions regarding its use.

Each target is manufactured using high-purity raw materials and precision casting, hot-pressing, or powder metallurgy techniques to ensure excellent homogeneity, low impurity content, and consistent film quality. The presence of copper enhances the hardness and electromigration resistance of aluminum-based films, making AlCu targets ideal for demanding deposition environments.

Product Highlights

Purity: ≥99.9%
Available Compositions: Al-2wt%Cu, Al-4wt%Cu, Al-8wt%Cu (custom ratios available)
Excellent Electrical and Thermal Conductivity
Improved Electromigration and Corrosion Resistance
High Density for Uniform Film Formation
Customizable Shapes and Dimensions (circular, rectangular, etc.)

Applications of AlCu Sputtering Targets

Semiconductors: Used in interconnects and contact layers where improved reliability and resistance to electromigration are essential.
Thin-Film Transistors (TFTs): Provides improved mechanical stability and conductivity for high-performance displays.
Photovoltaics: Serves as a conductive back electrode layer in solar cells, offering superior adhesion and reflectivity.
Optical Coatings: Applied to lenses and mirrors to create durable, high-reflectivity coatings with thermal resistance.
Data Storage: Deposited as part of multilayer structures in hard disks and memory devices for performance and durability.

Reports

Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
RoHS Compliance Documents (upon request)
Third-Party Testing Available on Request

Chemical Formula: AlCu
Appearance: Metallic
Melting Point: 548–660 °C (depending on Cu content)
Thermal Conductivity: 180–235 W/m·K
Electrical Conductivity: ~2.5–3.5 × 10⁷ S/m
Crystal Structure: FCC with intermetallic phases (depending on Cu%)
Magnetic Properties: Non-magnetic

Not classified as hazardous

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

SKU 132900ST Category Tags: Brand:

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