| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 3008130800ST001 | ZnO-Al2O3 | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 3008130800ST002 | ZnO-Al2O3 | 99.99% | Ø 25.4 mm x 3.175 mm | Inquire |
| 3008130800ST003 | ZnO-Al2O3 | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 3008130800ST004 | ZnO-Al2O3 | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 3008130800ST005 | ZnO-Al2O3 | 99.99% | Ø 76.2 mm x 3.175 mm | Inquire |
| 3008130800ST006 | ZnO-Al2O3 | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 3008130800ST007 | ZnO-Al2O3 | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
| 3008130800ST008 | ZnO-Al2O3 | 99.99% | Ø 101.6 mm x 6.35 mm | Inquire |
| 3008130800ST009 | ZnO-Al2O3 | 99.99% | Ø 152.4 mm x 3.175 mm | Inquire |
| 3008130800ST010 | ZnO-Al2O3 | 99.99% | Ø 152.4 mm x 6.35 mm | Inquire |
| 3008130800ST011 | ZnO-Al2O3 | 99.9% | 234.7 mm x 125 mm x 8 mm | Inquire |
Alumina-doped Zinc Oxide sputtering targets are primarily used to prepare transparent conductive oxide thin films, suitable for optoelectronic devices and functional thin film processes.
We can provide AZO sputtering targets with stable composition and dense structure, and support customization of size and process parameters. Please contact us for technical information.
Controllable doping ratio
High target density
Good film repeatability
Stable conductivity
Optional bonding and backplane
Suitable for medium-to-high power sputtering
Reliable batch consistency
Transparent Conductive Thin Films: Used to prepare functional thin films that balance light transmittance and conductivity, meeting display and optoelectronic requirements.
Photovoltaic Devices: Used as a front electrode or functional layer material, suitable for thin-film solar energy research and production.
Flat Panel Display Technology: Used in display device coating processes, helping to achieve stable electrical performance.
Research and Materials Development: Suitable for experimental verification of transparent conductive materials in universities and research institutions.
Q1: What is the difference between AZO sputtering targets and ordinary zinc oxide targets?
A1: By introducing aluminum, the conductivity of the thin film can be significantly improved while maintaining good light transmittance.
Q2: Is this target suitable for DC and RF sputtering?
A2: It can be selected according to specific process conditions and is commonly used in RF sputtering processes.
Q3: Will the target composition affect the stability of the thin film?
A3: The uniformity of composition directly affects the consistency of the thin film. We strictly control the doping ratio during the preparation process.
Q4: What precautions should be taken during the transportation and storage of the product?
A4: It is recommended to use shockproof packaging and keep the product dry to avoid surface moisture or mechanical damage.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have extensive experience in the field of conductive oxide sputtering targets and can consistently provide stable quality and professional technical support.
Molecular Formula: ZnO-Al2O3
Appearance: White to light gray target material
Density: Approximately 5.60 g/cm³
Crystal Structure: Hexagonal Wurtzite (P6₃mc)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
