ULPMAT

Alumina-doped Zinc Oxide (AZO)

Chemical Name:
Alumina-doped Zinc Oxide (AZO)
Formula:
ZnO-Al2O3
Product No.:
3008130800
CAS No.:
37275-76-6
EINECS No.:
Form:
Rotary Target
HazMat:
Product ID Formula Purity Dimension Inquiry
3008130800RT001 ZnO-Al2O3 99.9% ID125mm x OD133mm x 850mm Inquire
3008130800RT002 ZnO-Al2O3 99.95% OD332 mm x ID147 mm x 2mm Inquire
3008130800RT003 ZnO-Al2O3 99.99% OD32 mm x ID23 mm x 150mm Inquire
Product ID
3008130800RT001
Formula
ZnO-Al2O3
Purity
99.9%
Dimension
ID125mm x OD133mm x 850mm
Product ID
3008130800RT002
Formula
ZnO-Al2O3
Purity
99.95%
Dimension
OD332 mm x ID147 mm x 2mm
Product ID
3008130800RT003
Formula
ZnO-Al2O3
Purity
99.99%
Dimension
OD32 mm x ID23 mm x 150mm

Alumina-doped Zinc Oxide Rotary Targets Overview

Alumina-doped Zinc Oxide rotary targets are primarily used in large-area deposition processes, suitable for the continuous and stable fabrication of transparent conductive functional thin films.

We offer rotary targets in various sizes and structures. Please contact us directly for specification confirmation or technical support.

Product Highlights

High doping density
Uniform doping
Stable discharge
Consistent target consumption
Suitable for long-term operation
Good conductivity
Can be bonded to backplanes

Applications of Alumina-doped Zinc Oxide Rotary Targets

Large-area transparent conductive film deposition: Suitable for continuous deposition equipment in architectural glass, display panels, and other applications requiring high film uniformity.
Industrial-grade magnetron sputtering production lines: The rotating structure helps improve target utilization, meeting the needs of high-capacity, long-cycle operation.
Photovoltaics and functional glass: Can be used to prepare functional thin films that balance transmittance and conductivity, improving overall device efficiency.
R&D and pilot-scale production: Suitable for transitioning from experimental parameters to production conditions, with a stable process window and good repeatability.

FAQs

Q1: What are the advantages of rotating targets compared to planar targets?
A1: The rotating structure significantly improves target utilization and contributes to film thickness uniformity and discharge stability.

Q2: Which sputtering methods is this target suitable for?
A2: Primarily used in DC or medium-frequency magnetron sputtering equipment, suitable for continuous production lines.

Q3: Is the target prone to cracking during use?
A3: By optimizing the sintering process and structural design, thermal stress can be effectively reduced, improving reliability.

Q4: Does it support customized sizes and interfaces?
A4: Length, diameter, and connection structure can be customized according to equipment requirements for easy direct installation and use.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We have mature experience in rotating target manufacturing and quality control, and can continuously provide stable material solutions suitable for mass production processes.

Molecular Formula: ZnO-Al2O3
Appearance: White, dense ceramic target, tubular structure, with a bright and uniform surface
Density: Approximately 5.60 g/cm³
Crystal Structure: Hexagonal Wurtzite (P6₃mc)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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