Titanium Oxide sputtering targets are titanium oxide targets with mixed valence states, suitable for preparing functional oxide thin films in physical vapor deposition (PVD) processes. These targets are widely used in research fields related to phase change materials, electronic functional thin films, and transition metal oxides.
We can provide dense, compositionally stable Ti₃O₅ sputtering targets for research and functional thin film deposition. We support customized target backplanes and backplane bonding services. Contact us for relevant information.
Mixed valence state
Stable composition and crystal phase
Good sputtering process controllability
High thin film repeatability
Suitable for various PVD systems
Reliable batch consistency
Phase change functional thin films: Ti₃O₅ thin films, due to their unique phase change behavior, are often used in the study of phase change mechanisms and temperature-dependent electrical properties.
Electronic and Electrical Functional Thin Films: This target is suitable for depositing titanium oxide thin films with special electrical transport properties for research related to electronics and devices.
Transition Metal Oxide Thin Film Research: Widely used for exploring the structure and properties of thin films in transition metal oxide systems.
Research and Laboratory Thin Film Preparation: Suitable for universities and research institutions to conduct PVD thin film deposition experiments and develop new materials.
Q1: What types of thin films is Ti₃O₅ sputtering target mainly used for?
A1: Mainly used for preparing titanium oxide thin films with mixed valence states, commonly seen in phase transition and functional thin film research.
Q2: Is it necessary to control the oxygen atmosphere when using this target for sputtering?
A2: Generally, it is necessary to control the sputtering atmosphere to obtain a stable film composition and valence state distribution.
Q3: Which sputtering method is Ti3O5 sputtering target suitable for?
A3: This target is generally suitable for RF magnetron sputtering systems, and can also be used for other PVD processes depending on equipment conditions.
Q4: What are the research values of Titanium Oxide thin films?
A4: Their research value mainly lies in the study of phase transition behavior, electrical property regulation, and the mechanism of mixed valence oxides.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the stable preparation and quality control of titanium oxide sputtering targets, providing a reliable material foundation for Ti₃O₅ functional thin film research.
Molecular Formula: Ti₃O₅
Molecular Weight: 231.77 g/mol
Appearance: Dark blue or grayish-black target material
Density: Approximately 4.0 g/cm³
Melting Point: Approximately 1857 °C
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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