Titanium Aluminum Carbide sputtering targets are typical MAX phase material targets, possessing both metallic and ceramic properties, suitable for preparing functional thin films in physical vapor deposition (PVD) processes. These targets are widely used in functional coatings, conductive ceramic thin films, and advanced materials research.
We can provide structurally stable and reliably dense Ti3AlC2 sputtering targets for research and functional thin film deposition. Please contact us.
Typical MAX phase (M₃AX₂) material target
Dual metallic-ceramic properties
Good conductivity
Stable sputtering process
Good film composition consistency
Suitable for various PVD systems
Reliable batch stability
Functional Thin Films and Coating Materials: Can be used to deposit functional thin films with conductivity and structural stability, suitable for advanced coating materials research.
Conductive Ceramic Thin Films: Its metallic conductivity makes it a potential candidate for preparing conductive ceramics and related electronic thin film materials.
MAX Phase and Layered Material Research: This target is widely used in research on MAX phase thin films, layered structures, and their performance evolution.
Surface Engineering and Functional Coatings: Suitable for preparing high-temperature resistant, thermal shock resistant, or functional composite coatings for material surface modification research.
Q1: What type of thin films is the Titanium Aluminum Carbide sputtering target mainly used for?
A1: Mainly used for depositing MAX phase-related thin films or Ti–Al–C system functional thin films for conductivity and structural functionality research.
Q2: Is the Titanium Aluminum Carbide target suitable for magnetron sputtering?
A2: Yes, Ti₃AlC₂ has certain conductivity and is generally suitable for PVD processes such as magnetron sputtering.
Q3: Is the film composition stable when using a Ti₃AlC₂ sputtering target?
A3: Under appropriate process parameters and atmosphere control, films with good compositional repeatability can be obtained.
Q4: What are the research values of Ti₃AlC₂ thin films?
A4: Its research value is mainly reflected in the fields of conductive ceramic thin films, layered structure materials, and novel functional coatings.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the stable preparation and quality control of MAX phase and functional ceramic sputtering targets, providing a reliable material foundation for Ti₃AlC₂ thin film deposition.
Molecular Formula: Ti₃AlC₂
Molecular Weight: 194.0 g/mol
Appearance: Gray target material
Density: Approximately 4.2 g/cm³
Crystal Structure: Hexagonal (P6₃/mmc, MAX phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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