| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 1400ST001 | Si | 99.999% | Ø 50.8mm x 3.175 mm | Inquire |
| 1400ST002 | Si | 99.999% | Ø 50.8mm x 3.175 mm | Inquire |
| 1400ST003 | Si | 99.999% | Ø 50.8mm x 6.3 mm | Inquire |
| 1400ST004 | Si | 99.999% | Ø 76.2mm x 3.175 mm | Inquire |
| 1400ST005 | Si | 99.999% | Ø 76.2mm x 3.175 mm | Inquire |
| 1400ST006 | Si | 99.999% | Ø 76.2mm x 6.35 mm | Inquire |
| 1400ST007 | Si | 99.999% | Ø 76.2mm x 6.35 mm | Inquire |
| 1400ST008 | Si | 99.999% | Ø 76.2mm x 6.35 mm | Inquire |
| 1400ST009 | Si | 99.999% | Ø 101.6mm x 3.175 mm | Inquire |
| 1400ST010 | Si | 99.999% | Ø 101.6mm x 3.175 mm | Inquire |
| 1400ST011 | Si | 99.999% | Ø 101.6mm x 6.35 mm | Inquire |
| 1400ST012 | Si | 99.999% | Ø 101.6mm x 6.35 mm | Inquire |
| 1400ST013 | Si | 99.999% | Ø 152.4mm x 3.175 mm | Inquire |
| 1400ST014 | Si | 99.999% | Ø 152.4mm x 6.35 mm | Inquire |
| 1400ST015 | Si | 99.999% | Ø 203.2mm x 6.35 mm | Inquire |
| 1400ST016 | Si | 99.999% | 127mm x 787.4mm x 6mm | Inquire |
| 1400ST017 | Si | 99.999% | 151 mm x 113 mm x 7mm | Inquire |
| 1400ST018 | Si | 99.999% | 300 mm x 100 mm x 6mm | Inquire |
| 1400ST019 | Si | 99.99% | 350mm x 75mm x 6mm | Inquire |
Silicon sputtering targets are fundamental target materials used in thin film deposition processes, exhibiting excellent sputtering stability and film uniformity. They are widely used in semiconductor devices, photovoltaic thin films, display panels, and functional coatings.
We offer silicon sputtering targets in various specifications and structures, supporting application matching and process communication. Please contact us directly for solutions and quotations.
Stable sputtering process
Good film uniformity
Compatible with various sputtering equipment
Dense structure, high controllability
Customizable size and shape
Suitable for continuous production processes
Semiconductor Thin Film Deposition: Commonly used in semiconductor processes to prepare silicon-based functional thin films, meeting the film stability requirements of device manufacturing.
Photovoltaic and Solar Thin Films: In thin-film solar cells and related research, silicon targets can be used to deposit active or auxiliary functional layers.
Display and Optical Devices: Suitable for the preparation of functional thin films for display panels, optical windows, and related devices, supporting large-area deposition needs.
Research and Process Development: Widely used in laboratory sputtering systems and pilot lines, providing a stable material foundation for the development of new processes and new structure thin films.
Q1: What sputtering methods are silicon sputtering targets suitable for?
A1: They can be used in common physical vapor deposition processes such as DC sputtering and RF sputtering, depending on the equipment configuration and process parameters.
Q2: Is the film formed on the silicon target uniform during sputtering?
A2: Under appropriate process conditions, silicon targets exhibit good sputtering rate stability, which helps to obtain films with consistent thickness.
Q3: Do silicon sputtering targets usually require a backplane?
A3: Whether or not a backplane is required depends on the target size, equipment structure, and heat dissipation requirements. In some applications, a metal backplane structure is used.
Q4: Are silicon targets more suitable for R&D or mass production?
A4: Silicon sputtering targets are suitable for both research and process development, and can also meet the stability and repeatability requirements of industrial production.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in application-oriented supply of sputtering targets and related materials, emphasizing the compatibility and stability of targets in actual equipment. We provide customers with clear parameters, reliable delivery, and efficient technical support.
Molecular Formula: Si
Molecular Weight: 28.09 g/mol
Appearance: Silver-gray dense target
Density: 2.33 g/cm³
Melting Point: 1414 °C
Boiling Point: 3265 °C
Crystal Structure: Diamond cubic system
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
