ULPMAT

Lithium Tantalate

Chemical Name:
Lithium Tantalate
Formula:
LiTaO3
Product No.:
03730800
CAS No.:
12031-66-2
EINECS No.:
234-757-5
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03730800ST001 LiTaO3 99.9% Ø 50.8mm x 3.175mm Inquire
Product ID
03730800ST001
Formula
LiTaO3
Purity
99.9%
Dimension
Ø 50.8mm x 3.175mm

Lithium Tantalate Sputtering Target Overview

LiTaO₃ sputtering targets are highly dense and homogeneous functional material targets used in thin film fabrication, optoelectronic device research, and piezoelectric device research. They are widely used in surface acoustic wave (SAW) devices, optical modulators, and microelectronic functional thin film deposition.

We can provide highly dense and homogeneous LiTaO₃ sputtering targets. Size, thickness, and shape can be customized to customer requirements. Contact us for samples or customized solutions!

Product Highlights

High density ensures uniform thin film deposition
Stable crystal structure ensures reliable thin film deposition results
Customizable size, thickness, and shape
Supports research and industrial thin film fabrication
Fine surface finishing, low defect rate
Rapid response from our technical team

Applications of Lithium Tantalate Sputtering Targets

Surface Acoustic Wave Devices: Used for SAW device thin film deposition to improve device performance and signal accuracy.
Optoelectronic Devices: Supports the fabrication of optical modulators and nonlinear optical thin films, ensuring stable optical performance.
Piezoelectric Sensors: Used for thin film deposition in pressure, acceleration, and acoustic sensors to improve sensitivity and response speed.
Microelectronic Functional Thin Films: Used for high-precision thin film deposition in MEMS and microelectronic devices, ensuring functionality and uniformity.

FAQs

Q1: Is the LiTaO₃ target suitable for high-power magnetron sputtering?
A1: Yes, high-density targets maintain stable crystal structures under high-power magnetron sputtering, ensuring thin film uniformity.

Q2: Can the target size and thickness be customized?
A2: Yes, targets of different sizes and thicknesses, including circular, square, and special shapes, can be provided according to equipment requirements.

Q3: Is the target surface defect rate high?
A3: The surface is precision polished, resulting in a low defect rate, suitable for high-precision thin film fabrication.

Q4: What types of thin films is the target suitable for deposition?
A4: Suitable for ferroelectric/piezoelectric functional thin films, optoelectronic thin films, and microelectronic functional thin films.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have many years of experience in functional materials sputtering target production, providing customized, high-quality LiTaO₃ sputtering targets to ensure the stability and efficiency of thin film deposition in scientific research and industrial applications. Our technical team provides rapid response and professional support to help customers achieve high-precision thin film preparation.

Molecular Formula: LiTaO₃
Molecular Weight: 235.89 g/mol
Appearance: Light-colored, dense solid target material
Density: 7.46 g/cm³
Melting Point: 1650 °C
Crystal Structure: Trigonal

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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