ULPMAT

Lithium Managnese Cobalt Oxide

Chemical Name:
Lithium Managnese Cobalt Oxide
Formula:
LiMnCoO3
Product No.:
0325270800
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
0325270800ST001 LiMnCoO3 99.9% Ø 76.2mm x 3.175mm Inquire
Product ID
0325270800ST001
Formula
LiMnCoO3
Purity
99.9%
Dimension
Ø 76.2mm x 3.175mm

Lithium Manganese Cobalt Oxide Sputtering Targets Overview 

Lithium Managnese Cobalt Oxide sputtering targets are high-purity lithium-ion battery cathode material targets used for thin film preparation and scientific research experiments. They enable highly uniform thin film deposition and are widely used in power battery research, solid-state batteries, and functional coatings.

We can provide high-density, highly uniform Lithium Managnese Cobalt Oxide sputtering targets; dimensions and thicknesses can be customized to customer requirements. Contact us for samples and customized solutions!

Product Highlights

High purity, low impurities
Excellent density and mechanical strength
Stable crystal structure, uniform thin film deposition
Customizable size, shape, and thickness
Supports scientific and industrial applications
Fast delivery, comprehensive technical support

Applications of Lithium Manganese Cobalt Oxide Sputtering Targets

Power Battery Research: Used to prepare LMC thin film cathode materials for high-performance battery development.
Solid-State Batteries: Supports all-solid-state battery thin film deposition, ensuring interface uniformity and ionic conductivity.
Functional Coatings: Can be used for high-precision thin film preparation in optoelectronics, microelectronics, and other fields.

FAQs

Q1: Which deposition processes does the Lithium Managnese Cobalt Oxide sputtering target support?
A1: Suitable for conventional PVD processes such as magnetron sputtering and electron beam evaporation.

Q2: Can the target size and thickness be customized?
A2: Yes, various specifications are available according to customer equipment requirements.

Q3: How is the uniformity of the sputtered film?
A3: Optimized target density and crystal structure enable high-uniformity film deposition.

Q4: What are the purity and impurity control requirements for the target?
A4: Purity up to 99.9%, with strict control over metal impurities and oxygen content.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have professional target production equipment and technical team, and can provide customized, high-quality LMC sputtering targets to ensure stable and efficient thin film deposition results in scientific research and industrial applications.

Molecular formula: LiMnCoO3
Appearance: Black or dark gray dense solid target
Crystal structure: Hexagonal crystal system

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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