ULPMAT

Lithium Phosphate

Chemical Name:
Lithium Phosphate
Formula:
Li3PO4
Product No.:
03150800
CAS No.:
10377-52-3
EINECS No.:
233-823-0
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03150800ST001 Li3PO4 99.9% Ø 25.4mm x 5mm Inquire
Product ID
03150800ST001
Formula
Li3PO4
Purity
99.9%
Dimension
Ø 25.4mm x 5mm

Lithium Phosphate sputtering target Overview

Lithium Phosphate sputtering targets are high-purity ceramic materials specially engineered for thin-film deposition processes in advanced electronics and energy applications. Li₃PO₄ targets are essential in fabricating solid-state electrolytes, battery components, and functional coatings with excellent film uniformity and adhesion.

Our Li3PO4 sputtering targets has high density, phase purity, and low impurity levels. Available in various sizes and shapes, including circular and rectangular forms, they are tailored to meet specific customer requirements for research and industrial thin-film manufacturing. Please contact us if you have any questions.

Product Highlights

Purity: ≥99.9%
High density for uniform sputtering and film quality
Sizes and shapes tailored
Technical support for material selection
Flexible order quantities from small research to large industrial

Applications of Lithium Phosphate Sputtering Targets

Solid-State Batteries: Fabrication of thin-film electrolytes with high ionic conductivity
Electronic Devices: Coatings for lithium-ion conductors and functional layers
Optical Coatings: Application in transparent and durable functional coatings

FAQs

Q1: What types of thin films is the Lithium Phosphate sputtering target mainly used for?
A1: This target is mainly used for preparing lithium phosphate functional thin films, widely applied in research on solid-state electrolytes, lithium battery materials, and functional ceramic thin films.

Q2: What are the characteristics of Lithium Phosphate material in thin film preparation?
A2: This material has good chemical and structural stability, enabling the formation of uniform and reproducible thin film structures during sputtering.

Q3: Which deposition processes is this sputtering target suitable for?
A3: The Lithium Phosphate sputtering target can be used in PVD processes such as RF sputtering and DC sputtering, and is compatible with different laboratory and pilot-scale equipment.

Q4: What precautions should be taken when using and storing the Lithium Phosphate sputtering target?
A4: It is recommended to operate and store it in a dry, sealed environment, avoiding prolonged exposure to air to ensure the stability of the target during the deposition process and the quality of the thin film.

Reports

Each batch of Li3PO4 is supplied with a Certificate of Analysis (COA) and Material Safety Data Sheet (MSDS).
Third-party analysis can be provided on request.
Optional XRD, SEM, and density reports upon request.

Molecular Formula: Li₃PO₄
Molecular Weight: 115.79 g/mol
Appearance: Dense white solid target material
Density: 2.54 g/cm³
Melting Point: 837 °C
Crystal Structure: Orthorhombic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded