ULPMAT

Lithium Silicate

Chemical Name:
Lithium Silicate
Formula:
Li2SiO3
Product No.:
03140800
CAS No.:
10102-24-6
EINECS No.:
233-270-5
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03140800ST001 Li2SiO3 99.9% Ø 50.8mm x 4mm Inquire
Product ID
03140800ST001
Formula
Li2SiO3
Purity
99.9%
Dimension
Ø 50.8mm x 4mm

Lithium metasilicate sputtering target Overview

Lithium Silicate sputtering targets are advanced ceramic materials used for thin-film deposition in solid-state battery development, protective coatings, optical films, and other functional ceramic applications. Known for their high lithium content, good ionic conductivity, and excellent thermal stability.

Our Lithium Silicate sputtering targets are fabricated with high density, uniform microstructure, and purity ≥99.9%. Available in various sizes and shapes, including circular and rectangular types, they can also be customized to meet your exact requirements.

Product Highlights

Purity: ≥99.9% (custom higher purities available upon request)
High Density: For efficient and uniform film deposition
Low Impurity Levels: Ensures minimal contamination in thin films
Customizable: Size, shape, and backing plate configuration

Applications of Lithium Silicate Sputtering Targets

Solid-State Lithium Batteries: Thin-film electrolyte layers or interface engineering
Protective Coatings: For components exposed to lithium or corrosive environments
Optoelectronics: Functional or buffer layers in electroceramic devices
Catalysis: Thin film catalyst supports in lithium-related reactions

FAQs

Q1: What are the main thin film applications of Lithium Silicate sputtering targets?
A1: These sputtering targets are mainly used for preparing lithium silicate functional thin films, commonly found in solid-state electrolyte research, ion-conducting thin films, and functional ceramic coatings.

Q2: What material properties does Lithium Metasilicate possess in thin film preparation?
A2: This material exhibits good chemical stability and structural consistency, which is beneficial for forming uniform and continuous functional thin films during sputtering.

Q3: What deposition process conditions are suitable for this sputtering target?
A3: Lithium Metasilicate sputtering targets are suitable for PVD processes such as RF sputtering, meeting the thin film quality requirements of research and pilot-scale production.

Q4: What precautions should be taken when using Lithium Metasilicate sputtering targets?
A4: It is recommended to install and store the target in a dry environment, avoiding moisture or contamination, to ensure the stability of the sputtering process and the consistency of thin film performance.

Reports

Each batch of Li2SiO3 is supplied with a Certificate of Analysis (COA) and Material Safety Data Sheet (MSDS). Optional third-party test reports are available upon request.

Molecular Formula: Li₂SiO₃
Molecular Weight: 89.97 g/mol
Appearance: Dense white or off-white solid target material
Density: 2.52 g/cm³
Melting Point: 1201 °C
Crystal Structure: Monoclinic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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