Sodium hexafluoroaluminate sputtering targets are high-performance inorganic materials used in thin-film deposition for electronics, optics, and coating industries. Their composition ensures uniform deposition, excellent adhesion, and consistent film quality in PVD (Physical Vapor Deposition) processes.
We provide Na3AlF6 sputtering targets in various sizes suitable for industrial PVD systems. For inquiries or orders, please contact us directly.
High stability under vacuum deposition
Uniform composition for consistent thin films
Excellent adhesion to substrates
Suitable for electronics, optics, and coating applications
Low contamination and high purity for reliable performance
Strict quality control and testing
Electronics Industry: Used for coating dielectric layers, insulating films, and protective layers in electronic devices.
Optics & Photonics: Produces high-quality optical coatings with excellent transparency and uniformity.
Protective Coatings: Applied in decorative and functional coatings for corrosion and wear resistance.
Research & Development: Suitable for experimental thin-film deposition and materials science studies.
Q1: What industries commonly use Na3AlF6 sputtering targets?
A1: Electronics, optics, coatings, and research laboratories frequently use these targets for thin-film deposition.
Q2: How should Na₃AlF₆ targets be stored before use?
A2: Store in a dry, cool environment, protected from moisture and mechanical impact to maintain surface integrity.
Q3: Can Na₃AlF₆ sputtering targets be used in magnetron sputtering systems?
A3: Yes, they are fully compatible with magnetron and other PVD sputtering systems for uniform thin-film deposition.
Q4: What are the advantages of using Na₃AlF₆ targets in thin-film deposition?
A4: They provide uniform films, excellent adhesion, low contamination, and stable deposition rates, improving overall device performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We provide high-quality Na₃AlF₆ sputtering targets with reliable supply, rigorous quality control, and tailored solutions for PVD applications. Our products ensure consistent thin-film performance, excellent adhesion, and minimal contamination for electronics, optics, and research applications.
Molecular Formula: Na3AlF6
Molecular Weight: 209.94 g/mol
Appearance: White, dense target block
Density: 2.9–3.0 g/cm³ (sintered target)
Melting Point: 1000 °C
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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