ULPMAT

Magnesium Oxide

Chemical Name:
Magnesium Oxide
Formula:
MgO
Product No.:
120800
CAS No.:
1309-48-4
EINECS No.:
215-171-9
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
120800ST001 MgO 99.99% Ø 50.8mm x 3.175mm Inquire
120800ST002 MgO 99.99% Ø 76.2mm x 3.175mm Inquire
Product ID
120800ST001
Formula
MgO
Purity
99.99%
Dimension
Ø 50.8mm x 3.175mm
Product ID
120800ST002
Formula
MgO
Purity
99.99%
Dimension
Ø 76.2mm x 3.175mm

Magnesium Oxide Sputtering Target Overview

Magnesium Oxide sputtering targets are high-density, high-purity ceramic targets with excellent thermal stability and chemical inertness. They are widely used in magnetron or RF sputtering processes for optical thin films, electronic ceramic films, and functional coatings.

We offer magnesium oxide targets in various sizes, thicknesses, and densities, and can customize copper or aluminum backplane bonding solutions according to equipment requirements. Please contact us for parameters and quotations.

Product Highlights

High density, excellent sputtering stability
Excellent thermal stability, no deformation after long-term deposition
Smooth surface, high film uniformity
Strong chemical inertness, adaptable to various processes
Can be bonded with copper/aluminum backplanes to improve heat dissipation efficiency
Supports various sizes, thicknesses, and customized specifications

Applications of Magnesium Oxide Sputtering Targets

Optical Thin Film Preparation: Magnesium oxide targets can deposit dense, transparent films in RF or magnetron sputtering, ensuring film uniformity and repeatability.
Electronic Ceramic Films: Used for coating high-performance electronic devices, improving the dielectric properties and stability of thin films.
Functional Coating Deposition: Suitable for wear-resistant, heat-resistant, or high-stability coatings, meeting specific process requirements.
Research and Process Validation: Suitable for sputtering process validation in laboratory and pilot-scale stages, facilitating parameter optimization and material evaluation.

FAQs

Q1: Which equipment are sputtering targets suitable for?
A1: Suitable for research and industrial thin film deposition equipment such as RF sputtering and magnetron sputtering.

Q2: What is the difference between powder, Granules, Pellets, and targets?
A2: Powders are used for small-batch experiments and formulation mixing; Granules have good flowability and are suitable for continuous feeding; Pellets have high density and are stable during evaporation or sputtering; targets are compacted and molded, suitable for direct sputtering deposition, resulting in high film consistency.

Q3: Do targets support custom sizes or backplate bonding?
A3: Yes, we support round, square, and special-sized targets, and can provide copper or aluminum backplate bonding solutions to improve heat dissipation and lifespan.

Q4: How to store targets to maintain performance?
A4: Store in a dry, sealed environment to avoid moisture and contamination, ensuring the stability of the target surface and structure.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the preparation and bonding technology of high-purity magnesium oxide targets, providing products with high density, controllable dimensions, and high film consistency. We also offer technical support based on customer equipment and process requirements, helping customers efficiently complete thin film deposition and process validation.

Molecular Formula: MgO
Molecular Weight: 40.30 g/mol
Appearance: White, dense target block
Density: 3.58–3.60 g/cm³ (sintered target)
Melting Point: 2852 °C
Boiling Point: 3600 °C
Crystal Structure: Face-centered cubic (rock salt structure)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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