| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 120900ST001 | MgF2 | 99.9% | Ø 101.6mm x 3.175mm | Inquire |
| 120900ST002 | MgF2 | 99.99% | Ø 101.6mm x 3.175mm | Inquire |
| 120900ST003 | MgF2 | 99.99% | Ø 152.4mm x 3.175mm | Inquire |
| 120900ST004 | MgF2 | 99.99% | Ø 152.4mm x 6.35mm | Inquire |
| 120900ST005 | MgF2 | 99.99% | 550mm x 125mm x 6mm | Inquire |
Magnesium Fluoride sputtering targets are high-density fluoride ceramic targets with excellent thermal stability and chemical inertness. They are suitable for magnetron or RF sputtering deposition processes of optical thin films, functional coatings, and high-purity thin film materials.
We offer magnesium fluoride sputtering targets in various sizes, thicknesses, and density controls, and can customize backplane bonding solutions according to equipment requirements. Please contact us directly for parameters and quotations.
High density, stable sputtering process
Good thermal stability, no deformation after long-term deposition
Smooth surface, high film uniformity
Strong chemical inertness, adaptable to various processes
Can be bonded to copper/aluminum backplanes, high heat dissipation efficiency
Supports customization of various sizes and specifications
Optical Thin Film Preparation: Forms dense, transparent films in RF or magnetron sputtering, meeting the requirements of optical devices for uniform film thickness and repeatability.
Functional Coating Deposition: Suitable for the preparation of high-stability coatings, improving the wear resistance, heat resistance, and chemical stability of thin films.
High-purity thin film material research: Ensures the stability of film composition and structure in scientific research or industrial thin film development.
Process validation and equipment matching: Suitable for sputtering process validation in laboratory and pilot stages, facilitating parameter adjustment and material evaluation.
Q1: Which type of sputtering equipment is magnesium fluoride target suitable for?
A1: Can be used in RF sputtering, magnetron sputtering, and other equipment, suitable for scientific research and industrial thin film deposition.
Q2: Does target density affect film quality?
A2: High-density targets reduce the risk of particle detachment and improve film uniformity and consistency.
Q3: Can target size and backplate bonding be customized according to equipment specifications?
A3: Yes, we support round, square, and special-sized targets, and can provide copper or aluminum backplate bonding solutions to improve heat dissipation and lifespan.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the preparation and bonding technology of fluoride sputtering targets, providing stable and reliable products and rapid technical support to help customers efficiently complete thin film deposition, process validation, and equipment matching.
Molecular Formula: MgF2
Molecular Weight: 62.30 g/mol
Appearance: White, dense target block
Density: 3.14–3.16 g/cm³ (sintered target)
Melting Point: 1263 °C
Boiling Point: 2239 °C
Crystal Structure: Tetragonal (anatase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
