Magnesium Bismuth sputtering targets are functional targets primarily composed of magnesium bismuth intermetallic compounds, suitable for stabilizing thin film deposition processes. These targets are mainly used in research on functional thin films, thermoelectric-related films, and electronic materials.
We offer magnesium bismuth compound sputtering targets in various sizes, thicknesses, and with controlled composition, supporting rapid selection and quotation.
Stable intermetallic compound composition
High target density, smooth sputtering process
Good electrical conductivity, high deposition efficiency
High surface flatness, good film consistency
Flexible specifications, custom processing supported
Suitable for research and small-batch production
Functional Thin Film Deposition: Can be used to prepare functional thin films, meeting applications with high requirements for compositional uniformity and film quality.
Thermoelectric Thin Film Research: In the field of thermoelectric materials, this target is suitable for related film deposition, aiding in experimental parameter optimization and performance research.
Electronic Materials and Devices Development: Can be used for the preparation of thin films for electronic devices and related structures, improving film stability and repeatability.
Scientific Research and Process Validation: Suitable for universities and research institutions to conduct process validation and pilot-scale experiments on new material thin films.
Q1: Which type of sputtering equipment is suitable for magnesium bismuth sputtering targets?
A1: Adaptable to DC or RF sputtering systems, suitable for various experimental and industrial equipment.
Q2: Does target density affect film quality?
A2: Higher density results in a more stable sputtering process, contributing to a uniform and dense film.
Q3: Can target sizes be customized according to equipment requirements?
A3: Yes, we support customized processing of round, square, and other special sizes.
Q4: What precautions should be taken when storing targets?
A4: It is recommended to store in a dry, sealed environment to avoid surface contamination affecting performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the preparation and quality control of intermetallic compound sputtering targets, providing stable and reliable products and rapid technical support to help customers efficiently meet their thin film preparation needs.
Molecular Formula: Mg3Bi2
Molecular Weight: 452.94 g/mol
Appearance: Silver-gray dense target block
Density: 7.0 g/cm³ (sintered target)
Melting Point: 703 °C
Crystal Structure: Hexagonal crystal system
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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