Magnesium Orthosilicate sputtering targets are high-density, homogeneous ceramic targets with excellent thermal stability and wear resistance. They are widely used in the manufacture of optical thin films, functional coatings, and high-performance electronic devices.
We offer Mg2SiO4 sputtering targets in various sizes, shapes, and density controls to meet the needs of industrial and research applications. Please inquire for a quote.
High density, excellent sputtering uniformity
Low coefficient of thermal expansion, strong heat resistance
High chemical stability, not easily oxidized
Customizable particle size and purity
Excellent surface smoothness, suitable for precision thin film deposition
Supports various target sizes and shapes
Optical Thin Film Deposition: Can be used to prepare high-quality optical thin films, ensuring uniform film thickness to meet the requirements of precision optical devices.
Functional Coating Materials: Used in wear-resistant, corrosion-resistant, and insulating coatings to improve film adhesion and long-term stability.
Electronic Device Manufacturing: Suitable for the deposition of microelectronic components and ceramic substrates, ensuring film uniformity and reliability.
Scientific Research and Pilot-Scale Applications: Supports laboratory and pilot-scale sputtering process verification, facilitating the research and optimization of new material thin films.
Q1: Magnesium Orthosilicate Sputtering Target – Which sputtering equipment is it suitable for?
A1: Suitable for DC, RF, and magnetron sputtering equipment, meeting different process requirements.
Q2: Does target density affect film uniformity?
A2: Higher density results in lower particle shedding during sputtering and better film uniformity.
Q3: Do you support customized sizes and shapes?
A3: Supports various round, square, and irregularly shaped targets, which can be processed according to customer drawings.
Q4: Does the target surface require special treatment?
A4: The targets are pre-surface-planed and can be used directly in sputtering processes.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the research and development and production of high-performance ceramic sputtering targets, providing stable quality and customized services. We can quickly respond to customer inquiries, helping scientific research and industrial production to be implemented efficiently.
Molecular Formula: Mg₂SiO₄
Molecular Weight: 140.69 g/mol
Appearance: Light green or white dense target
Density: 3.27–3.30 g/cm³ (sintered target)
Melting Point: 1890 °C
Crystal Structure: Orthorhombic (olivine structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
