Boron Oxide sputtering targets are functional ceramic targets with boron oxide as the main component, suitable for the preparation of non-metallic oxide thin films. These targets are commonly used in thin film deposition research related to electronics, optics, and functional coatings.
We can provide matching boron oxide sputtering targets based on your equipment type and process conditions, supporting customized specifications. Please contact us directly to confirm solutions and pricing.
Stable ceramic structure
Uniform composition distribution
Controllable sputtering process
Suitable for RF sputtering
Supports backplane bonding
Research and development friendly
Oxide Functional Thin Film Deposition: Can be used to prepare boron oxide-containing thin films, suitable for applications with requirements on film composition and structure.
Electronic and Insulating Thin Film Research: In the field of electronic materials, this target can be used for the deposition and performance evaluation of insulating or functional layer thin films.
Optics and Protective Coating Exploration: Boron oxide thin films have research value in optics and surface protection, and the target is suitable for related coating experiments.
Sputtering Process and Parameter Validation: This target is commonly used for process window testing under RF sputtering conditions, such as power, atmosphere, and deposition rate optimization.
Q1: Is it suitable for RF sputtering?
A1: Yes, boron oxide is a ceramic material and is typically sputtered using RF sputtering.
Q2: Can the target be bonded to a backplate?
A2: Yes, bonding with common metal backplates is supported to improve stability.
Q3: Is custom non-standard size supported?
A3: Yes, it can be processed according to the size of the sputtering equipment and usage requirements.
Q4: Is small-batch or sample procurement possible?
A4: Yes, suitable for research and process development stages.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in the processing and supply of oxide ceramic sputtering targets, enabling us to quickly understand our customers’ process requirements and provide efficient support in terms of specification confirmation, delivery time response, and material stability, helping you shorten your R&D cycle and reduce trial-and-error costs.
Molecular Formula: B₂O₃
Molecular Weight: 69.62 g/mol
Appearance: White, dense target block
Density: 2.46–2.50 g/cm³
Melting Point: 450 °C
Boiling Point: 1860 °C
Crystal Structure: Monoclinic (crystalline form); amorphous target with irregular lattice
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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