Calcium oxide sputtering targets are high-performance ceramic targets used in physical vapor deposition (PVD) technology. They are primarily employed to deposit calcium oxide films with unique alkaline earth metal oxide properties, holding significant research and application value in cutting-edge fields such as semiconductor devices, optical coatings, and surface protection.
We specialize in providing high-purity, high-density calcium oxide sputtering targets. Precision dimensional processing and backing plate bonding are available to meet your specific equipment and process requirements. For customized solutions, please contact us anytime.
Ultra-high purity and theoretical density
Excellent chemical and thermal stability
Precisely controlled microstructure and crystalline orientation
Low impurity content ensuring intrinsic film properties
Semiconductors and Functional Devices: Deposited as gate dielectric or buffer layer materials for studying novel high-dielectric-constant materials or interface engineering in perovskite-structured devices.
Optical Films and Coatings: Used to fabricate anti-reflective, protective, or highly reflective films for specific wavelength bands (e.g., UV or IR), exploring their potential applications in specialized optical windows.
Surface Engineering and Protection: Deposited as high-temperature oxidation-resistant coatings or diffusion barriers to enhance the stability of metal substrates in extreme environments.
Frontier Materials Science Research: Serving as model materials or precursors to investigate growth mechanisms and interfacial phenomena of alkaline earth metal oxides, as well as their novel functions in catalysis, sensing, and other fields.
Q1: Is calcium oxide target material stable in air? How should it be stored?
A1: Calcium oxide readily reacts with moisture and carbon dioxide in air, causing surface degradation. It must be stored long-term in vacuum or dry inert gas environments. Surface cleaning or activation may be required before use.
Q2: What special process conditions are typically required when sputtering with this target?
A2: Since calcium oxide is an insulating material, RF sputtering mode must be used. To obtain films with accurate stoichiometry, reactive sputtering is typically performed in an argon atmosphere containing an appropriate amount of oxygen. Precise control of substrate temperature and deposition rate is also necessary.
Q3: What are the primary characteristics of calcium oxide films?
A3: Calcium oxide films exhibit high dielectric constant, wide bandgap, and excellent thermal stability. Their properties are highly dependent on the deposition process, enabling the creation of diverse functional materials ranging from insulators to those with ionic conductivity.
Q4: Why is bonding required for calcium oxide targets?
A4: Bonding provides thermal dissipation and mechanical support for brittle ceramic targets, preventing cracking during sputtering.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and manufacturing of high-performance oxide ceramic targets, possessing mature and rigorous technical solutions for the preparation, processing, and storage of highly reactive materials like calcium oxide. We not only ensure targets achieve top-tier purity and density at shipment but also prioritize their stability and reliability during subsequent use.
Molecular Formula: CaO
Molecular Weight: 56.08 g/mol
Appearance: White solid target material
Density: 3.34 g/cm³
Melting Point: 2,572 °C
Boiling Point: 2,850 °C
Crystal Structure: Face-centered cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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