Scandium oxide sputtering targets are ceramic targets manufactured from high-purity powder using advanced processes, suitable for various physical vapor deposition systems. This product can deposit thin films with excellent optoelectronic properties, making it a core source material for the preparation of advanced functional materials.
We can provide scandium oxide ceramic targets of different sizes, purities, and bonding methods according to customer needs. For specific specifications and technical details, please contact us directly.
High density
Precise and controllable stoichiometry
Uniform microstructure, free of cracks and pores
Good thermal shock resistance, long service life
Transparent Conductive Thin Films: Used for depositing high-performance scandium tin oxide thin films, serving as transparent electrodes for touch screens and solar cells, combining high transmittance and excellent conductivity.
Optical Protective Coatings: Prepare scandium oxide protective layers on the surfaces of precision optical components, significantly enhancing their wear resistance, laser damage resistance, and environmental stability.
Solid-state electrolyte films: Used in all-solid-state batteries and electrochromic devices, deposited scandium oxide-based films exhibit high ionic conductivity and good interface compatibility.
High-dielectric gate dielectrics: Used as high-dielectric-constant gate dielectric materials in semiconductor devices, they help reduce leakage current and improve device integration.
Q1: What are the main differences between scandium oxide targets and scandium metal targets in applications?
A1: Scandium metal targets are mainly used for depositing metallic functional films; scandium oxide ceramic targets are specifically used for depositing oxide films, which have unique performance advantages in optics, electronics, and protection.
Q2: How to choose a suitable target bonding method?
A2: Common methods include brazing, conductive adhesive bonding, and no-bonding designs. The selection needs to comprehensively consider power density, heat dissipation requirements, and process chamber structure. We can provide professional advice based on your equipment.
Q3: How to prevent target surface cracking during sputtering?
A3: Optimizing process parameters (such as power, gas pressure, and atmosphere ratio) and ensuring high initial target density and uniform structure are key. We can provide process window references and recommend matching sputtering conditions.
Q4: What is the typical lead time for the products?
A4: Standard specifications are usually in stock; for non-standard customized products, the production cycle is generally 4-8 weeks depending on the complexity. We will do our best to coordinate to meet your project time requirements.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request.
We specialize in the research and development and manufacturing of advanced ceramic sputtering targets, possessing mature powder processing, molding, and sintering technologies. Through strict control of raw material purity and process flow, we ensure that every target has reliable and consistent high performance. We not only provide products, but also strive to be your technology partner, offering professional material solutions and continuous technical support in the development and production of thin films.
Molecular Formula: Sc₂O₃
Molecular Weight: 137.91 g/mol
Appearance: White, dense target block
Density: 3.86 g/cm³
Melting Point: 2485 °C
Boiling Point: 4300 °C
Crystal Structure: Cubic (Bixbyite-type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
