Vanadium silicide sputtering targets are functional targets that combine excellent conductivity with high-temperature stability, suitable for various physical vapor deposition processes. These targets can be used to prepare silicide thin films with uniform structure and stable performance.
We offer vanadium silicide sputtering targets in various sizes, shapes, and with controlled density. Please contact us for customized solutions and technical support.
High sputtering stability
Dense and uniform target
Good film conductivity
Reliable for high-temperature applications
Customizable structure and size
Stable batch consistency
Conductive Functional Thin Film Preparation: Suitable for preparing conductive functional thin films, which can be used for the deposition of electronic devices and related functional layers.
High-Temperature Electronic Material Coatings: Utilizing its excellent thermal stability, stable functional coatings can be prepared at high temperatures to meet the requirements of high-temperature electronic applications.
Device Surface Modification: Vanadium silicide thin films formed by sputtering can improve the electrical properties and operational stability of device surfaces.
Scientific Research and Thin Film Process Research: This target is commonly used in silicide thin film and deposition process research, suitable for laboratory and pilot-scale applications.
Q1: Which sputtering methods are suitable for vanadium silicide sputtering targets?
A1: Suitable for DC or RF sputtering processes, providing good film uniformity and stability.
Q2: How does target density affect film performance?
A2: Higher density helps improve film adhesion and electrical consistency.
Q3: Is this target suitable for continuous sputtering?
A3: Under appropriate cooling and process conditions, it can meet the requirements for long-term continuous sputtering.
Q4: What precautions should be taken during use?
A4: It is recommended to keep the target surface clean and dry, and to control sputtering parameters appropriately according to equipment conditions.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in the preparation of silicide sputtering targets and can reliably provide vanadium silicide sputtering targets with consistent performance. We also provide targeted support based on our customers’ process requirements to help achieve high-quality thin film deposition.
Molecular Formula: VSi₂
Molecular Weight: 86.95 g/mol
Appearance: Silvery-gray metallic luster, metallic texture
Density: 4.76 g/cm³
Melting Point: 1890°C
Crystal Structure: Hexagonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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