Vanadium oxide sputtering targets are reversible metal-insulator phase change functional targets suitable for various physical vapor deposition processes. They can be used to prepare dense, stable smart functional thin films, widely applied in optical modulation and thermal management.
We offer VO2 sputtering targets of various sizes, crystal forms, and density controls. Contact us for customized solutions and technical support.
High-density target
Good sputtering stability
Controllable thin film phase change performance
Suitable for smart thermal control thin film preparation
Customizable size and crystal form
Reliable batch consistency
Smart Thermal Control Thin Film Preparation: Capable of depositing smart temperature-controlled thin films that adjust infrared transmittance according to ambient temperature changes, achieving energy saving and thermal management functions.
Optical Modulation Device Coating: VO2 thin films formed by sputtering can be used in optical modulators, smart windows, and infrared devices, improving device response speed and stability.
Functional Electronic Thin Films: VO2 targets are suitable for preparing functional electronic thin films for sensors and electronic devices, ensuring consistent and reliable film performance.
Research and Process Development: Targets are commonly used in the research of VO2 thin films and phase change functional materials, providing a stable material foundation for laboratory and pilot-scale applications.
Q1: Which sputtering processes are suitable for vanadium oxide targets?
A1: They can be used for magnetron sputtering, DC sputtering, or RF sputtering, ensuring film continuity and structural uniformity.
Q2: How does the density of the target affect film performance?
A2: High-density targets help form functional films with good adhesion and dense structure, improving the stability of phase change properties.
Q3: Are targets suitable for long-term continuous sputtering?
A3: With proper cooling and process control, continuous or long-term deposition requirements can be met.
Q4: What precautions should be taken when using VO2 targets?
A4: It is recommended to keep the target clean and dry, avoid impact and dust inhalation during operation, and control the sputtering temperature and atmosphere according to the equipment’s recommended parameters.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have long focused on the preparation and application support of functional vanadium oxide sputtering targets, providing dense, stable VO2 sputtering targets, and offering professional advice tailored to customer process requirements to ensure high-quality fabrication of smart thin films and functional devices.
Molecular Formula: VO₂
Molecular Weight: 69.88 g/mol
Appearance: Black or brown metallic luster
Density: 4.37 g/cm³
Melting Point: 1930°C
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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