| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 230500ST001 | VB2 | 99.5% | Ø 25.4mm x 6.35mm | Inquire |
| 230500ST002 | VB2 | 99.5% | Ø 50.8mm x 3.175mm | Inquire |
| 230500ST003 | VB2 | 99.5% | Ø 50.8mm x 6.35mm | Inquire |
| 230500ST004 | VB2 | 99.5% | Ø 76.2mm x 3.175mm | Inquire |
| 230500ST005 | VB2 | 99.9% | Ø 25.4mm x 3.175mm | Inquire |
| 230500ST006 | VB2 | 99.9% | Ø 101.6mm x 3.175mm | Inquire |
Vanadium boride sputtering targets are functional targets with vanadium boride as the main component, possessing a high melting point and good structural stability. These targets are primarily used in physical vapor deposition processes, playing a crucial role in the preparation of wear-resistant, high-temperature resistant, and functional thin films.
We offer VB2 sputtering targets in various sizes, densities, and processing methods. Please inquire for specific specifications and delivery solutions.
High-melting-point sputtering material
Dense target structure
Good compositional uniformity
High-temperature sputtering stability
Good film adhesion
Custom processing supported
Wear-resistant functional thin films: Significantly improves film hardness and lifespan when depositing wear-resistant films, suitable for surface protection in high-friction environments.
High-temperature protective coatings: Thin films prepared using these targets exhibit good thermal stability under high-temperature conditions, suitable for surface protection of high-temperature components.
Functional ceramic thin film research: Commonly used in the preparation of functional ceramic thin films and related composite films to meet the needs of material performance control and structural optimization.
Research and Materials Development: Providing stable and reproducible sputtering sources for new material development and thin film mechanism research.
Q1: Which sputtering processes are suitable for vanadium boride sputtering targets?
A1: This target can be used in conventional physical vapor deposition processes and is suitable for various experimental and industrial sputtering equipment.
Q2: Is the VB2 target stable during high-temperature sputtering?
A2: It has high thermal stability and maintains good sputtering performance under appropriate process parameters.
Q3: Can the target size and shape be customized?
A3: Yes, targets with different diameters, thicknesses, and structural forms can be customized according to equipment requirements.
Q4: What are the suitable applications for thin films prepared using vanadium boride sputtering targets?
A4: Primarily used in research fields related to wear-resistant coatings, high-temperature protective films, and functional materials.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the preparation and supply of functional sputtering targets, are familiar with the key control points of VB2 sputtering targets in practical sputtering applications, and can provide stable quality, flexible customization, and professional technical support to help customers improve the efficiency and consistency of thin film preparation.
Molecular Formula: VB₂
Molecular Weight: 69.72 g/mol
Appearance: Black or dark gray metallic luster
Density: 4.1 g/cm³
Melting Point: 3000°C
Crystal Structure: Hexagonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
