Vanadium Oxide – Boron sputtering targets are functional targets doped with boron on a vanadium oxide base, possessing the ability to control the electrical and optical properties of thin films. This material is widely used in the preparation of electrochromic thin films, functional devices, and high-performance thin films in scientific research.
We offer V2O5-B sputtering targets in various specifications, supporting customized processes and equipment adaptation. Please contact us for detailed solutions.
Uniform boron doping
Tunable thin film properties
Stable sputtering process
Dense target structure
Suitable for RF sputtering processes
Supports backplane bonding
Electrochromic Thin Film Preparation: Can be used to prepare electrochromic thin films; boron doping results in faster response speeds and superior optical controllability.
Functional Device Thin Films: Thin films prepared with this target can be applied to sensors or microelectronic devices, improving film conductivity and stability.
Research on Novel Energy Materials: V₂O₅-B thin films can improve ion transport performance in energy storage devices, and the sputtering target provides a reliable source for the preparation of high-performance thin films.
Scientific Research and Process Exploration: Widely used in universities and research institutions for thin film structure, process parameter optimization, and functional verification.
Q1: What is the difference between V₂O₅-B sputtering targets and ordinary V₂O₅ targets?
A1: After doping with boron, the conductivity and optical response of the thin film can be regulated, while the film density and uniformity are also improved.
Q2: What are the requirements for the sputtering process when depositing Vanadium Oxide-Boron thin films?
A2: Radio frequency sputtering is usually used. The power and atmosphere need to be adjusted according to the film thickness and doping ratio to obtain ideal film performance.
Q3: Does the Vanadium Oxide-Boron target support backplane bonding?
A3: Yes, it can be bonded to a metal backplane according to equipment requirements to improve target stability and heat dissipation efficiency.
Q4: Is Vanadium Oxide – Boron film suitable for research or production applications?
A4: This sputtering target is suitable for research experiments and functional thin film development, and can also be used for small-batch production and process verification.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the research and supply of functional oxides and doped sputtering targets. We are familiar with the application characteristics of V2O5-B in research and industrial thin films, and can provide stable target quality, flexible specification customization, and comprehensive technical support to help customers successfully complete thin film preparation and performance verification.
Molecular formula: V₂O₅-B
Appearance: Dark brown or black powder with a metallic luster
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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