| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 230801ST001 | V2O5 | 99.9% | Ø 25.4mm x 3.175mm | Inquire |
| 230801ST002 | V2O5 | 99.9% | Ø 76.2mm x 3.175mm | Inquire |
| 230801ST003 | V2O5 | 99.9% | Ø 101.6mm x 3.175mm | Inquire |
| 230801ST004 | V2O5 | 99.9% | Ø 120mm x 6.35mm | Inquire |
| 230801ST005 | V2O5 | 99.9% | 149 mm x 34 mm x 6 mm | Inquire |
| 230801ST006 | V2O5 | 99.9% | 149 mm x 34 mm x 6 mm | Inquire |
Vanadium Oxide sputtering targets are typical vanadium oxide targets suitable for preparing functional thin films with optical and electrical response properties. This material is commonly used in research fields such as smart materials, functional coatings, and related thin film processes.
We can provide V2O5 sputtering target processing and supply services according to different equipment requirements. Please contact us for corresponding specifications.
Definitive Oxide Phase Composition
Dense Target Structure
Stable and Controllable Sputtering Process
Good Thin Film Consistency
Suitable for RF Sputtering
Supports Backplane Bonding Structures
Electrochromic and Optical Thin Films: Can be used to prepare thin films with optical control capabilities, with application value in the research of smart windows and optical functional materials.
Functional Sensor-Related Thin Films: Thin films prepared with this target exhibit good response characteristics to changes in the external environment, suitable for the research and development of sensor materials.
Energy and Energy Storage Material Thin Film Research: V2O5 thin films are of research significance in the field of energy-related materials, and sputtering targets provide a stable source for their preparation.
Research and Process Parameter Optimization: Suitable for universities and research institutions, used for sputtering parameter optimization, thin film structure control, and performance testing.
Q1: What is the main role of Vanadium Oxide sputtering targets in thin film deposition?
A1: This target serves as the material source for vanadium oxide thin films, used to form functional layers with specific optical, electrical, or chemical properties.
Q2: Are there any special requirements for sputtering parameters when using V₂O₅ targets?
A2: Sputtering power, gas ratio, and substrate temperature all affect the thin film structure, and process optimization is usually required based on the target application.
Q3: Are Vanadium Oxide sputtering targets stable in long-term use?
A3: Under reasonable sputtering conditions, the target exhibits good structural stability and is suitable for continuous or repeated deposition experiments.
Q4: In which research areas are thin films prepared using Vanadium Oxide targets commonly used?
A4: Commonly used in electrochromic, energy-related thin films, sensing functional materials, and novel oxide thin film research.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the long-term supply of oxide sputtering targets, are familiar with the application characteristics of V₂O₅ in functional thin films, and can provide stable product quality, flexible specification customization, and clear technical support.
Molecular Formula: V₂O₅
Molecular Weight: 181.88 g/mol
Appearance: Orange or red powder
Density: 3.36 g/cm³
Melting Point: 690°C
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
