Vanadium metal rotary targets are highly efficient sputtering materials for continuous thin film deposition, suitable for long-term stable operation in vacuum coating processes. This product is primarily used in large-area coatings, functional thin film preparation, and industrial and research fields with high requirements for film consistency.
We can provide vanadium metal rotary sputtering targets adapted to different equipment specifications and support customized structures and dimensions. Please contact us for technical support.
Suitable for continuous sputtering processes
High target utilization rate
Good film uniformity
Strong structural stability
Supports back-tube bonding
Compatible with mainstream coating equipment
Large-area functional thin film deposition: Vanadium metal rotary targets are suitable for continuous sputtering of large-area substrates, improving production efficiency and maintaining film thickness consistency.
Industrial vacuum coating production: On industrial coating lines, rotary targets help extend the single-use cycle, reduce downtime for replacement, and increase overall capacity.
Semiconductor and electronic device coating: This target material can be used to prepare vanadium-related thin films, meeting the requirements of electronic devices for film stability and repeatability.
Research and Process Scale-up Validation: Rotating targets are suitable for process scale-up from experimental to pilot-scale stages, used to evaluate the deposition performance of vanadium thin films under different operating conditions.
Q1: What are the main advantages of a vanadium metal rotating target compared to a planar target?
A1: The rotating target continuously updates its surface during sputtering, helping to improve target utilization and film uniformity.
Q2: Is a vanadium rotating target suitable for long-term continuous operation?
A2: Yes, this product is designed for continuous sputtering conditions and can support stable use for extended periods.
Q3: Does a vanadium metal rotating target require back-tube bonding?
A3: Usually yes. Depending on equipment requirements, the vanadium target will be bonded to a metal back-tube to improve heat dissipation and mechanical stability.
Q4: What types of coating equipment is the vanadium rotating target suitable for?
A4: This target is compatible with various industrial coating equipment; specific interfaces and dimensions can be customized according to equipment parameters.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in rotating sputtering targets and related metallic materials, are familiar with the process characteristics of vanadium metal in continuous sputtering, and can provide reliable product consistency, flexible customization capabilities, and clear technical communication to help customers achieve stable and efficient thin film production.
Molecular Formula: V
Molecular Weight: 50.9415 g/mol
Appearance: Silver-gray metallic rotating target
Density: 6.11 g/cm³
Melting Point: 1910°C
Boiling Point: 3377°C
Crystal Structure: Hexagonal close-packed (hcp)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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