Chromium Nickel Alloy sputtering targets are high-performance materials composed of a chromium and nickel alloy, exhibiting excellent corrosion resistance and good electrical conductivity. They are widely used in thin film deposition, optical coating, and electronic devices, and are particularly suitable for environments requiring high strength and high temperature resistance.
We offer high-quality Chromium Nickel Alloy sputtering targets to meet the requirements of various fields for thin film deposition and coating. For any questions or customization needs, please contact us, we will provide you with the best product and technical support.
Excellent corrosion resistance
High strength and good electrical conductivity
Excellent sputtering efficiency
Provides highly uniform thin film deposition
Strong high-temperature stability
Customizable specifications and dimensions
Thin Film Deposition: These targets are widely used in the semiconductor, optoelectronic, and solar cell industries, enabling efficient deposition of uniform thin films to improve device stability and performance.
Optical Coating: These targets are commonly used in optical coatings, depositing high-quality reflective and anti-reflective films, widely applied in lasers, optical lenses, and other devices to enhance their optical performance.
Electronic Devices: Targets are used in electronic devices to create conductive layers, providing high conductivity and stability, making them suitable for manufacturing integrated circuits, sensors, and other devices.
High-Temperature Coatings: This alloy target exhibits excellent high-temperature stability, providing wear-resistant and corrosion-resistant coatings in high-temperature environments, and is widely used in aerospace, energy equipment, and other fields.
Q1: What is the sputtering efficiency of the Chromium Nickel Alloy sputtering target?
A1: The target has high sputtering efficiency, capable of generating uniform and stable films in a short time, making it ideal for high-efficiency thin film deposition and large-scale production.
Q2: What precautions should be taken when using Chromium Nickel Alloy sputtering targets?
A2: During use, it is recommended to keep the target surface clean to avoid contaminants affecting film quality. Simultaneously, the temperature and atmosphere of the sputtering environment should be controlled to ensure optimal deposition results.
Q3: How is bonding between the backplate and the Chromium Nickel Alloy target performed?
A3: Bonding between the backplate and the target typically uses welding or adhesive techniques to ensure the target is firmly attached to the backplate, ensuring stable sputtering results. We offer a variety of bonding technologies and provide solutions to meet different needs.
Q4: How do Chromium Nickel Alloy sputtering targets perform in high-temperature environments?
A4: The targets exhibit excellent high-temperature resistance, maintaining good sputtering stability even under high-temperature conditions, making them suitable for high-temperature coatings and high-performance alloy applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
With years of industry experience, we provide high-quality Chromium Nickel Alloy sputtering targets and are committed to providing customized services and comprehensive technical support. Choosing us means you’ll receive reliable products, fast delivery times, and excellent after-sales service to help your projects run smoothly.
Molecular formula: CrNi
Appearance: Silver-gray target material
Crystal structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
