Chromium Diboride sputtering targets are high-hardness, high-wear-resistance, and high-temperature-resistant chromium boride targets widely used in high-end thin film deposition. They are primarily used in the manufacture of coatings requiring high hardness and wear resistance, optoelectronic devices, and high-temperature alloys.
We offer high-quality CrB2 sputtering targets suitable for various thin film deposition applications, providing long-term stable performance for your projects. Please feel free to contact us with any questions or customization needs.
Extremely high hardness and wear resistance
Excellent oxidation resistance and high-temperature resistance
High sputtering efficiency
Stable thin film deposition characteristics
Customizable target sizes and shapes
Professional technical support and service
Thin Film Deposition: Widely used in high-end thin film deposition, providing uniform and high-quality films, particularly suitable for high-tech industries such as electronic components, sensors, and solar cells.
Wear-Resistant Coatings: This target has important applications in high-hardness coatings, particularly suitable for cutting tools, mechanical parts, and mining equipment, significantly improving the wear resistance and service life of equipment.
High-Temperature Alloys: Sputtering targets are used in the production of high-temperature alloys to significantly improve their high-temperature resistance and thermal stability, making them suitable for aerospace, automotive, and other industries.
Optoelectronic Devices: In the manufacture of optical coatings and optoelectronic devices, sputtering targets provide efficient thin film deposition, enhancing the anti-reflection properties and durability of devices. They are widely used in lasers, displays, and other fields.
Q1: What is the sputtering efficiency of Chromium Diboride sputtering targets?
A1: The targets have very high sputtering efficiency, enabling rapid deposition of uniform and high-quality thin films, making them particularly suitable for large-scale production.
Q2: Which sputtering technologies are Chromium Diboride sputtering targets suitable for?
A2: The targets are suitable for various sputtering technologies, such as magnetron sputtering and ion sputtering, and are widely used in various thin film deposition and coating processes.
Q3: What are the high-temperature resistance properties of CrB2 targets?
A3: The targets have excellent high-temperature resistance, capable of operating stably at temperatures exceeding 2000°C, making them suitable for applications in high-temperature environments.
Q4: How are Chromium Diboride sputtering targets packaged?
A4: We package the targets in sealed, moisture-proof bags, then in a rigid outer box to ensure the product is not damaged during transportation and to maintain its quality and stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the production of high-performance CrB2 sputtering targets, possessing years of industry experience and a professional technical team. Choosing us will give you high-quality products, flexible customization services, and comprehensive technical support to ensure the successful implementation of your projects.
Molecular Formula: CrB₂
Molecular Weight: 112.00 g/mol
Appearance: Grayish-black target material
Density: 6.08 g/cm³
Melting Point: 2800 °C
Crystal Structure: Hexagonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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