| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 241300ST001 | CrAl | 99.7% | Ø 50.8 mm x 3.175 mm | Inquire |
| 241300ST002 | CrAl | 99.9% | Ø 130 mm x 20 mm | Inquire |
| 241300ST003 | CrAl | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 241300ST004 | CrAl | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 241300ST005 | CrAl | 99.99% | Ø 101.6 mm x 6.35 mm | Inquire |
Chromium aluminide sputtering targets offer excellent wear resistance and high-temperature stability. They are widely used in thin film deposition, electro-optic coating, and high-temperature alloying, and are particularly suitable for industrial equipment requiring high heat and corrosion resistance.
We offer high-quality CrAl sputtering targets that meet stringent industrial standards and are suitable for a variety of thin film deposition applications. Please feel free to contact us with any customization needs or technical inquiries.
Excellent high-temperature resistance
Excellent corrosion resistance
Strong wear resistance
Precise target size and shape control
High sputtering efficiency
Customizable services
Customizable bonding and backplane
Thin Film Deposition: Targets are widely used in thin film deposition in optoelectronic devices, semiconductor manufacturing, and other fields, providing high-quality films that improve device performance and stability.
Electro-optic Coating: This target has important applications in optical and electro-optic coatings, significantly improving the durability of lenses and filters, and enhancing their light transmittance and anti-reflection properties.
High-Temperature Alloys: Targets are used in the production of high-temperature alloys to enhance their oxidation resistance and thermal stability. They are widely used in high-temperature operating environments in industries such as aerospace and petrochemicals.
Surface Treatment: Used for hardening and corrosion protection of metal and alloy surfaces, particularly suitable for industrial environments requiring high wear and corrosion resistance.
Q1: How are Chromium Aluminide sputtering targets packaged?
A1: We use highly sealed packaging for our targets to ensure that the product is protected from moisture, contamination, or mechanical damage during transportation, maintaining its stability and integrity.
Q2: What is the sputtering efficiency of this target?
A2: The target has very high sputtering efficiency, enabling rapid deposition of uniform and stable thin films, making it particularly suitable for large-scale production and high-efficiency deposition requirements.
Q3: Are Chromium Aluminide sputtering targets suitable for coatings in high-temperature environments?
A3: Yes, the target has excellent high-temperature resistance and can operate stably for extended periods in high-temperature environments, making it particularly suitable for high-temperature coatings and thin film applications.
Q4: Can the size of Chromium Aluminide sputtering targets be customized?
A4: We offer sputtering targets in various specifications. Customers can customize the size, shape, and other technical parameters of the targets according to their needs to ensure they meet application requirements.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
Our company has many years of industry experience and is committed to providing high-quality CrAl sputtering targets and offering personalized customization services. Choosing us will give you stable and reliable products, fast delivery, and comprehensive technical support, helping your projects succeed.
Molecular formula: CrAl
Appearance: Silver-gray target material
Crystal structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
