Iron gallium alloy sputtering targets are specifically designed for preparing functional thin films with high-performance magnetostrictive properties using physical vapor deposition (PVD).
We offer FeGa alloy targets in various composition ratios and specifications, and support customized services such as backplane bonding. Please inquire for specific requirements.
Strong magnetostrictive properties
Precisely controllable thin film composition
Low coercivity and good soft magnetism
Dense and uniform target structure
Custom alloy composition supported
High-performance sensors: Used for depositing magnetostrictive thin films to fabricate highly sensitive current, magnetic field, or stress sensors for precise measurements.
Magnetoelectric coupling devices: As a key magnetostrictive layer, combined with piezoelectric materials, it is used to fabricate next-generation low-power, high-sensitivity microwave devices and memory cells.
High-frequency microelectronic devices: The fabricated thin films can be used as core functional layers in advanced electronic components such as integrated micro-antennas and high-frequency filters.
Biomedical devices: Devices developed based on its functional thin films have application potential in precision medicine, novel treatment technologies, and other fields.
Q1: How can I ensure that the composition of the sputtered film is consistent with that of the target?
A1: We employ advanced smelting and forming processes to ensure uniform target composition. For extremely high precision requirements, we can provide process guidance, allowing for fine-tuning of the film composition during sputtering through methods such as pre-placed patches.
Q2: Which sputtering process is recommended for Iron gallium targets?
A2: Radio frequency (RF) magnetron sputtering is a commonly used and mature method that effectively deposits alloy thin films. We can provide basic process parameter references based on your equipment.
Q3: What are the performance advantages of Iron gallium thin films?
A3: Its main advantage lies in the combination of a high magnetostriction coefficient and good soft magnetic properties (low coercivity), which enables devices to possess both high sensitivity and low drive power consumption.
Q4: What are the precautions for target storage and use?
A4: It is recommended to store in a dry and clean environment. During use, ensure the target is installed correctly, avoid short circuits, and follow the equipment’s specified pre-sputtering cleaning and inspection procedures.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the research and development and preparation of high-performance alloy sputtering targets, possessing a deep understanding of the core applications of functional materials such as Iron gallium alloy in cutting-edge devices. Through precise control of the entire smelting and processing process, we ensure accurate target composition, dense structure, and stable performance.
Molecular Formula: FeGa
Molecular Weight: 114.81 g/mol
Appearance: Silver-gray
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
