Iron Oxide sputtering targets possess excellent magnetic and chemical stability, making them widely used in thin film deposition, electronic devices, and magnetic materials.
We offer high-quality Fe3O4 sputtering targets, customizable to customer specifications, suitable for various thin film deposition applications and meeting high-performance requirements. Contact us for more product information.
High Purity
Excellent Magnetic Properties
High Chemical Stability
Suitable for High-Precision Thin Film Deposition
Customizable Sizes
Professional Technical Support
Customizable Backplanes and Bonding
Thin Film Deposition: Fe3O4 sputtering targets are commonly used in physical vapor deposition (PVD) processes, widely applied in the preparation of thin films for semiconductors, optoelectronic devices, and electronic components, improving film quality.
Magnetic Materials: Due to their excellent magnetic properties, they are widely used in the production of magnetic recording, sensors, and magnetic storage materials.
Electronic Devices: Play a crucial role in the manufacture of magnetic electronic components, widely used in the production of magnetic thin films in the electronics industry.
Optical Coating: In optical coating production, it helps improve the optical performance of the coating and is widely used in the production of lenses, displays, and other products.
Q1: What are the main uses of Fe3O4 sputtering targets?
A1: Widely used in thin film deposition, magnetic material production, and optical coating, especially suitable for high-magnetic materials and high-precision thin film applications.
Q2: What are the purity requirements for Fe3O4 sputtering targets?
A2:We offer Fe3O4 sputtering targets with a purity of up to 99.95%, ensuring optimal results in various high-precision applications.
Q3: How to improve the sputtering efficiency of Fe3O4 sputtering targets?
A3: By optimizing the target thickness and deposition parameters, the sputtering efficiency of Fe₃O₄ sputtering targets can be effectively improved, achieving higher thin film quality.
Q4: What are the storage conditions for Iron Oxide sputtering targets?
A4: They should be stored in a dry, cool environment, avoiding high humidity and direct sunlight to maintain target performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have many years of professional manufacturing experience and are committed to providing high-quality, high-performance Fe3O4 sputtering targets. We offer customized services to meet different customer needs and provide comprehensive technical support to ensure the success of every project.
Molecular Formula: Fe₃O₄
Molecular Weight: 231.53 g/mol
Appearance: Black ceramic-like target material
Density: Approx. 5.17 g/cm³
Melting Point: Approx. 1597 °C
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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