| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 260800ST001 | Fe2O3 | 99.9% | Ø 25.4 mm x 3.175 mm | Inquire |
| 260800ST002 | Fe2O3 | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 260800ST003 | Fe2O3 | 99.9% | Ø 50.8 mm x 6.35 mm | Inquire |
| 260800ST004 | Fe2O3 | 99.9% | Ø 76.2 mm x 3.175 mm | Inquire |
| 260800ST005 | Fe2O3 | 99.9% | Ø 101.6 mm x 1.58 mm | Inquire |
| 260800ST006 | Fe2O3 | 99.9% | Ø 203.2 mm x 2 mm | Inquire |
| 260800ST007 | Fe2O3 | 99.995% | Ø 50.8 mm x 6.35 mm | Inquire |
Iron Oxide Sputtering targets are solid source materials made of high-purity iron oxide ceramic, primarily used in physical vapor deposition (PVD) processes. They deposit thin films of iron oxide with specific optoelectronic, magnetic, or catalytic functions on substrates using methods such as magnetron sputtering. This material is widely used in optical coatings, magnetic devices, sensors, and cutting-edge photoelectrocatalysis research.
Our Fe2O3 targets can be customized in various shapes and sizes, including circular and rectangular, to meet your needs, ensuring a dense microstructure and stable performance. Please contact us for a detailed specifications list.
Ultra-high purity
Selectable crystal forms
High density and low porosity
Flexible and customizable specifications
Optical Thin Films and Coatings: Used for preparing antireflective films, interference filters, and various optical coatings. The refractive index, hardness, and other properties of the thin film are closely related to the purity of the target material.
Magnetic Functional Devices: Serving as the core target material for preparing key magnetic thin films in magnetic recording media, magnetic sensors, and magnetoelectronic devices. Gas and Chemical Sensors: Used for depositing sensitive thin films, their purity and microstructure directly affect the sensor’s sensitivity, selectivity, and response speed.
Photovoltaics and Catalysis Research: Used in solar energy conversion and catalysis as materials for preparing photoanodes or catalytic thin films. High purity and good crystallinity help improve conversion efficiency and stability.
1. What is an iron oxide sputtering target used for?
An iron oxide sputtering target is a solid source material used in physical vapor deposition (PVD) to deposit iron oxide-containing thin films onto suitable substrates. These films are investigated for applications in magnetic materials, optical coatings, functional oxide films, sensors, and electronic or energy-related research. The resulting film properties depend on the target composition, deposition method, oxygen conditions, substrate, and processing parameters.
2. Which iron oxide compounds are used for sputtering targets: FeO, Fe₂O₃, or Fe₃O₄?
Iron oxide sputtering targets may be made from different iron oxide phases, including iron(II) oxide (FeO), iron(III) oxide (Fe₂O₃), and iron(II,III) oxide (Fe₃O₄). These compounds differ in iron oxidation state, crystal structure, and functional properties. Fe₂O₃ includes distinct phases such as hematite and maghemite, while Fe₃O₄ is magnetite. Because phase composition affects deposition behavior and film characteristics, buyers should confirm the exact chemical formula and phase required rather than relying on the generic name “iron oxide.”
3. Can an iron oxide sputtering target be used to produce magnetic thin films?
Yes. Iron oxide targets, particularly those with a specified Fe₃O₄ composition, can be used in research on magnetic oxide thin films. However, the magnetic behavior of the deposited film is not determined by the target alone. Oxygen partial pressure, substrate temperature, deposition energy, film thickness, crystallinity, and post-deposition treatment can influence phase formation and magnetic properties. The target phase and deposition process should therefore be selected together to meet the intended research requirements.
4. What specifications matter most when selecting an iron oxide sputtering target?
The key specifications include chemical formula and phase composition, purity, target dimensions, thickness, density, porosity, and mechanical integrity. Depending on the sputtering system, buyers may also need to specify the backing plate, bonding method, mounting holes, and dimensional tolerances. For reproducible thin-film research, verify the supplier’s technical data sheet (TDS) and available quality documentation, including impurity information where required.
5. How does an iron oxide sputtering target differ from a metallic iron target?
A metallic iron target consists primarily of elemental Fe, whereas an iron oxide target contains iron chemically combined with oxygen. Sputtering from an oxide target can provide a different starting composition and process behavior from depositing iron and introducing oxygen through reactive sputtering. In either case, the final film’s stoichiometry and phase may differ from the target composition because of process conditions, preferential sputtering, and oxygen availability. The appropriate choice depends on the required film composition and the capabilities of the deposition system.
6. Why can the deposited film differ from the composition of an iron oxide sputtering target?
The target composition does not always translate directly into an identical thin-film composition. During sputtering, film formation can be affected by oxygen partial pressure, substrate temperature, deposition rate, plasma conditions, and interactions at the substrate surface. Iron oxide phases may also change under different oxygen or thermal conditions. When a specific phase or oxidation state is essential, deposition parameters should be optimized and the resulting film verified using suitable characterization methods, such as X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), or other application-appropriate techniques.
7. What information should I provide when requesting an iron oxide sputtering target quotation from ULPMAT?
When requesting a quotation from ULPMAT, specify the required iron oxide formula or phase, purity, target dimensions, quantity, and intended application. It is also helpful to provide the sputtering system or cathode type, backing plate and bonding requirements, and any critical density or impurity specifications. If your project requires a particular oxidation state or crystal phase, state this explicitly so that the product requirements can be evaluated accurately.
8. Can ULPMAT provide iron oxide sputtering targets in custom dimensions or compositions?
ULPMAT can review inquiries for iron oxide sputtering targets based on the required composition, purity, dimensions, and application. Availability of specific oxide phases, target geometries, and customization options must be confirmed for each order. For non-standard requirements, provide a technical drawing or dimensional specification along with the target formula, quantity, and deposition-system requirements to help determine a suitable option.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We focus on the research and development and production of high-performance ceramic sputtering targets, deeply understanding the decisive influence of material purity, crystal form, and microstructure on the final thin film performance. From high-purity powder synthesis to precision sintering, we implement strict quality control throughout the entire process to ensure that every target material has excellent quality.
Molecular Formula: Fe₂O₃
Molecular Weight: 159.69 g/mol
Appearance: Dense solid, reddish-brown to dark red
Density: Approx. 5.24 – 5.26 g/cm³
Melting Point: Approx. 1565 °C (decomposes)
Boiling Point: Approx. 3414 °C (decomposes)
Crystal Structure: Usually trigonal (α-Fe₂O₃, hematite structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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