ULPMAT

Cobalt Tantalum Zirconium alloy

Chemical Name:
Cobalt Tantalum Zirconium alloy
Formula:
CoTaZr
Product No.:
27734000
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
27734000ST001 CoTaZr 99.5% Ø 50.8 mm x 3.175 mm Inquire
Product ID
27734000ST001
Formula
CoTaZr
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm

Cobalt Tantalum Zirconium Alloy Sputtering Targets Overview

Cobalt Tantalum Zirconium alloy sputtering targets are high-performance cobalt-tantalum-zirconium alloy targets with excellent corrosion resistance and thermal stability, widely used in magnetic thin films, high-temperature conductive layers, and microelectronic device deposition.

We offer CoTaZr alloy targets in various sizes, purities, and crystal forms, and support sample testing and technical consultation. Please contact us for detailed information and process solutions.

Product Highlights

Excellent corrosion resistance
Good thermal stability
Reliable conductivity
Suitable for various sputtering processes
Customizable size and crystal form
Customizable bonding and backplane
Strict batch consistency control
Flexible delivery cycle
Supports scientific research experiments and process verification

Applications of Cobalt Tantalum Zirconium Alloy Sputtering Targets

Magnetic Thin Film Preparation: Cobalt Tantalum Zirconium alloy sputtering targets are suitable for magnetic thin film deposition, ensuring dense and uniform films and improving magnetic property stability.
Microelectronic Device Deposition: Used for metallization layer deposition in microelectronic devices, improving device conductivity and thermal stability. High-Temperature Conductive Layer: Conductive thin films can be deposited at high temperatures, exhibiting excellent thermal stability and corrosion resistance.
Scientific Research and Materials Development: Widely used in research institutions and corporate R&D departments for material performance testing and process parameter optimization.

FAQs

Q1: Which sputtering processes are suitable for Cobalt Tantalum Zirconium alloy sputtering targets?
A1: Suitable for various thin film deposition processes such as magnetron sputtering, RF sputtering, and DC sputtering.

Q2: Can the target crystal form be customized?
A2: Yes, different crystal forms of targets can be provided according to customer needs to meet performance requirements.

Q3: Are the targets prone to cracking during use?
A3: Prepared using a high-density metallurgical process, the grains are uniform, effectively reducing the risk of cracking and porosity.

Q4: What precautions should be taken when storing the target?
A4: It is recommended to store the target in a sealed, dry, and ventilated environment, avoiding moisture and contamination to maintain the stability of the target performance.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the research and stable supply of high-purity cobalt-tantalum-zirconium alloy sputtering targets. With a comprehensive quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.

Molecular formula: CoTaZr
Appearance: Silver-gray to metallic-luster target material with a smooth surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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