Cobalt-Iron alloy

Cobalt-Iron Alloy Sputtering Target Overview

Cobalt-Iron Alloy sputtering targets are high-performance metal alloy targets that combine excellent magnetic properties, wear resistance, and structural stability. They are widely used in thin film deposition and electronic device manufacturing.

We can provide cobalt iron alloy sputtering targets of different sizes, composition ratios, and purity grades according to customer needs, and support technical consultation and sample evaluation. Please contact us for more information.

Product Highlights

Excellent Magnetic Properties
High Wear and Corrosion Resistance
Good Thermal Stability
Suitable for Multiple Sputtering Processes
Flexible Size and Composition Customization
Strong Batch Supply Capability
After-sales and Technical Support

Applications of Cobalt-Iron Alloy Sputtering Targets

Magnetic Thin Film Preparation: Cobalt-Iron alloy target is suitable for preparing high-performance magnetic thin films, which can be applied to sensors, memory, and microelectronic devices.
Electronic Component Manufacturing: Cobalt-Iron alloy target can be used for metal thin film deposition in electronic components, ensuring stable and consistent device performance.
Research and Process Development: Cobalt-Iron alloy target is widely used in research institutions and corporate R&D departments for research on the performance of magnetic thin film materials and optimization of process parameters.
Energy and Functional Devices: Suitable for the preparation of energy devices and functional coatings, improving device efficiency and stability.

FAQs

Q1: What types of sputtering equipment is the Cobalt-Iron Alloy sputtering target suitable for?
A1: It can be used in common sputtering equipment such as magnetron sputtering, DC sputtering, and RF sputtering. The specific target specifications are selected according to the power and size of the equipment.

Q2: Can the cobalt-iron alloy target size be customized?
A2: Yes, targets of different diameters, thicknesses, and shapes can be customized according to equipment requirements.

Q3: Are sputtering targets prone to cracking or porosity?
A3: This product is prepared using a dense metallurgical process, resulting in high density and uniform structure, effectively reducing the risk of cracking and porosity.

Q4: What precautions should be taken when storing the target?
A4: It is recommended to store in a dry, well-ventilated environment, avoiding moisture, contamination, and prolonged oxidation to maintain the stability of the target performance.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and stable supply of high-performance cobalt-iron alloy sputtering targets. With a mature quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.