ULPMAT

Cobalt Chromium Iron Nickel

Chemical Name:
Cobalt Chromium Iron Nickel
Formula:
CoCrFeNi
Product No.:
2724262800
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
2724262800ST001 CoCrFeNi 1:1:1:1at% Ø 50.8 mm x 3.175 mm Inquire
2724262800ST002 CoCrFeNi 1:1:1:1at% Ø 76.2 mm x 3.175 mm Inquire
Product ID
2724262800ST001
Formula
CoCrFeNi
Purity
1:1:1:1at%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
2724262800ST002
Formula
CoCrFeNi
Purity
1:1:1:1at%
Dimension
Ø 76.2 mm x 3.175 mm

Cobalt Chromium Iron Nickel Sputtering Target Overview

The Cobalt Chromium Iron Nickel sputtering target is a multi-metal composite target that enables synergistic deposition of components, suitable for the preparation and research of functional and structural thin films.

We offer target solutions in various sizes, component ratios, and bonding methods, supporting project-level communication. Please contact us for technical information and pricing.

Product Highlights

Uniform composition and stable microstructure
Good sputtering process stability
High film repeatability
Customizable component ratios available
Multiple size options available
Long-term stable supply

Applications of Cobalt Chromium Iron Nickel Sputtering Targets

Functional Thin Film Deposition: This target is suitable for the preparation of multifunctional thin films, facilitating the achievement of thin film structures with tunable composition and synergistic performance.
Magnetic and Structural Thin Film Research: Commonly used in magnetic or structural thin film research, supporting performance evaluation under different elemental ratios.
Abrasion-Resistant and Corrosion-Resistant Coatings: In surface engineering, it can be used to prepare composite thin film systems with abrasion-resistant and corrosion-resistant properties.

FAQs

Q1: Is this target material more suitable for DC or RF sputtering?
A1: The choice depends on the specific equipment conditions. It is compatible with most common systems. We recommend determining the choice based on the target material size and thin film requirements.

Q2: Do you support custom sizes for non-standard films?
A2: Yes, we can customize the target material according to the equipment cavity and fixture requirements.

Q3: Does the target material require special treatment before use?
A3: We generally recommend surface cleaning and pre-sputtering to ensure stable thin film quality.

Q4: Can you provide long-term project supply?
A4: Yes, we support batch-based, stable supply arrangements according to project cycles.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We focus on the research and development and stable supply of multi-metal sputtering targets, with a complete quality control process and mature customization capabilities. We can provide customers with reliable, traceable target solutions suitable for scientific research and application transformation, helping thin film projects to advance efficiently.

Molecular Formula: CoCrFeNi
Appearance: Silver-gray metallic
Density: 8.0 g/cm³
Melting Point: 1,350 ℃
Crystal Structure: Face-centered cubic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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