ULPMAT

Nickel Titanium Alloy

Chemical Name:
Nickel Titanium Alloy
Formula:
NiTi
Product No.:
282200
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
282200ST001 NiTi 99.9% Ø 50 mm x 3 mm Inquire
282200ST002 NiTi 99.9% Ø 101.6 mm x 5 mm Inquire
282200ST003 NiTi 99.9% Ø 101.6 mm x 6.35 mm Inquire
Product ID
282200ST001
Formula
NiTi
Purity
99.9%
Dimension
Ø 50 mm x 3 mm
Product ID
282200ST002
Formula
NiTi
Purity
99.9%
Dimension
Ø 101.6 mm x 5 mm
Product ID
282200ST003
Formula
NiTi
Purity
99.9%
Dimension
Ø 101.6 mm x 6.35 mm

Nickel Titanium Alloy Sputtering Target Overview

Nickel Titanium Alloy sputtering targets are high-purity nickel-titanium alloy targets widely used in the preparation of smart material thin films, shape memory alloy devices, conductive coatings, and scientific research thin films.

We offer a variety of sizes of dense, uniform, and chemically stable NiTi sputtering targets to meet diverse process requirements. Please contact us for detailed technical information.

Product Highlights

High-purity NiTi alloy
Uniform and dense target
Excellent shape memory properties
Good electrical conductivity
Strong thermal stability
Reliable batch consistency
Supports bonding and backplane customization

Applications of Nickel Titanium Alloy Sputtering Targets

Smart Material Thin Film Preparation: Suitable for the preparation of shape memory alloy thin films, improving device response speed and stability.
Shape Memory Alloy Devices: Used for thin film deposition in micro-actuators, sensors, and other devices, enhancing functionality and durability.
Conductive Coatings: Can be used for the preparation of conductive films and functional coatings, improving the conductivity of electronic devices.
Scientific Research and Process Development: Suitable for research institutions to conduct performance testing of NiTi material thin films and develop new processes.

FAQs

Q1: Can the size and shape of NiTi sputtering targets be customized?
A1: Targets of different sizes and shapes can be provided according to sputtering equipment and process requirements.

Q2: How stable are the targets during the deposition process?
A2: High-purity NiTi targets have good thermal stability, ensuring uniform film deposition.

Q3: What types of thin films are the targets suitable for?
A3: Suitable for smart material thin films, shape memory alloy thin films, and conductive film deposition.

Q4: How do you ensure batch consistency of the targets?
A4: Through rigorous production processes and quality testing, we ensure consistent target composition and performance.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and supply of high-purity NiTi sputtering targets, emphasizing the advantages of dense and uniform targets, chemical stability, and shape memory properties. We provide reliable material support for the deposition of smart material thin films, shape memory alloy devices, and scientific research thin films.

Molecular formula: NiTi
Appearance: Metallic luster, silvery-white or grayish-white
Crystal structure: Face-centered cubic structure

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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