ULPMAT

Nickel Terbium Alloy

Chemical Name:
Nickel Terbium Alloy
Formula:
NiTb
Product No.:
286500
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
286500ST001 NiTb 99.9% Ø 101.6 mm x 3.175 mm Inquire
286500ST002 NiTb 99.9% Ø 101.6 mm x 3.175 mm Inquire
Product ID
286500ST001
Formula
NiTb
Purity
99.9%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
286500ST002
Formula
NiTb
Purity
99.9%
Dimension
Ø 101.6 mm x 3.175 mm

Nickel Terbium Alloy Sputtering Target Overview

Nickel Terbium Alloy sputtering targets are high-purity nickel-terbium alloy targets suitable for the preparation of semiconductor devices, magnetic thin films, conductive coatings, and scientific research thin films.

We provide dense, uniform, and high-purity NiTb sputtering targets, which can be customized to meet different process requirements. Please contact us for detailed technical information.

Product Highlights

High-purity nickel-terbium alloy
Uniform and dense target
Excellent magnetic properties
Good electrical conductivity
Strong thermal stability
Reliable batch consistency
Supports bonding and backplane customization

Applications of Nickel Terbium Alloy Sputtering Targets

Semiconductor Device Preparation: Suitable for thin film deposition in transistors, integrated circuits, etc., improving device performance and stability.
Magnetic Thin Films: Used for functional thin films such as magnetic storage devices and magnetic sensors, enhancing magnetic properties and data stability.
Conductive Coatings: Can be used for the preparation of conductive films and functional coatings, improving the conductivity and durability of electronic devices.
Scientific Research and Process Development: Suitable for research institutions to conduct NiTb material performance testing and new process development experiments.

FAQs

Q1: What sizes and shapes of NiTb sputtering targets are available?
A1: Targets of different sizes and shapes can be provided according to sputtering equipment and process requirements.

Q2: How stable are the targets during thin film deposition?
A2: High-purity NiTb targets have good thermal stability, ensuring uniform thin film deposition.

Q3: What types of thin films are the targets suitable for?
A3: Suitable for semiconductor thin films, magnetic thin films, and conductive films.

Q4: How is batch consistency of targets guaranteed?
A4: Through rigorous production processes and quality testing, we ensure consistent composition and performance.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and supply of high-purity NiTb sputtering targets, emphasizing the advantages of uniform and dense targets, chemical stability, and magnetic and conductive properties, providing reliable material support for semiconductor device, magnetic thin film, and scientific thin film deposition.

Molecular formula: NiTb
Appearance: Metallic luster, usually silvery-gray

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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