Nickel Molybdenum Alloy sputtering targets are nickel-molybdenum alloy targets primarily used for the deposition of corrosion-resistant and highly stable functional thin films.
We offer NiMo sputtering targets with controllable composition ratios and high density, compatible with various sputtering equipment. Please contact us for technical information.
Stable nickel-molybdenum ratio
Dense alloy microstructure
Uniform film structure
Suitable for magnetron sputtering processes
Outstanding corrosion resistance
Good operational stability
Corrosion-resistant functional thin films: Commonly used to prepare functional thin films requiring high chemical stability, improving device lifespan in complex environments.
Microelectronics and thin-film devices: Used in some microelectronic processes to form structurally stable alloy layers, meeting the process requirements for film consistency.
Structural and protective coatings: Applicable to the preparation of protective coating films requiring certain mechanical and chemical stability.
Research and process development: Suitable for experimental use in research institutions for alloy thin film structure control, sputtering parameter optimization, and exploration of new applications.
Q1: Which sputtering method is NiMo sputtering target suitable for?
A1: It can be used in conventional magnetron sputtering processes. The specific method needs to be confirmed based on equipment conditions.
Q2: Can the nickel and molybdenum ratio in the target be customized?
A2: Yes, customized solutions with different composition ratios are available based on thin film performance requirements.
Q3: Is the target stable during deposition?
A3: Under appropriate power and atmosphere conditions, the target deposition process is stable, which helps maintain film consistency.
Q4: Do you support small-sized targets for research purposes?
A4: Yes, we can provide various specifications suitable for R&D and verification stages.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the preparation and processing of alloy sputtering targets, emphasizing composition control, structural stability, and process adaptability, providing customers with reliable thin film deposition material support.
Molecular Formula: NiMo
Appearance: Silvery-white metallic target with a smooth surface
Crystal Structure: Body-centered cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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