| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 28242600ST001 | NiCrFe | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 28242600ST002 | NiCrFe | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 28242600ST003 | NiCrFe | 99.95% | Ø 154.2 mm x 6.35 mm | Inquire |
| 28242600ST004 | NiCrFe | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
| 28242600ST005 | NiCrFe | 99.95% | 300 mm x 100 mm x 6 mm th. | Inquire |
| 28242600ST006 | NiCrFe | 99.95% | 300 mm x 100 mm x 6 mm th. | Inquire |
Inconel 600 sputtering targets are high-purity nickel-chromium-iron alloys suitable for the preparation of high-temperature thin films and functional electronic materials.
We offer Nickel Chromium Iron Alloy sputtering targets in various sizes, thicknesses, and structures, and can customize them according to customer equipment and process requirements. Please contact us for technical information and quotations.
High-purity alloy
Dense and uniform target material
Stable thin film deposition
Excellent high-temperature corrosion resistance
Stable discharge performance
Customizable backplane and bonding
Reliable batch consistency
High-temperature corrosion-resistant thin film deposition: NiCrFe targets can be used for thin film deposition in high-temperature environments, improving the long-term stability and corrosion resistance of materials.
Electronic functional layer preparation: Suitable for functional thin film deposition in electronic devices, ensuring conductivity and film uniformity.
Industrial corrosion-resistant coatings: Can be used for the preparation of industrial coatings or protective layers, enhancing surface corrosion resistance and service life.
Scientific research and materials development: Targets are suitable for scientific research experiments and the development of new material processes, achieving repeatable and stable thin film deposition.
Q1: What are the suitable applications for NiCrFe sputtering targets?
A1: Commonly used for high-temperature corrosion-resistant thin films, electronic functional layers, industrial coatings, and research material development.
Q2: Which sputtering equipment is the target compatible with?
A2: Available in various sizes and thicknesses, compatible with mainstream DC and RF sputtering systems.
Q3: Is the NiCrFe target stable at high temperatures?
A3: It exhibits excellent high-temperature corrosion resistance and high thin film deposition stability.
Q4: How should NiCrFe sputtering targets be stored?
A4: It is recommended to store them in a dry, sealed container, avoiding impact and moisture to ensure the stability of the target performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in supplying nickel-based and nickel-chromium-iron alloy sputtering targets, providing high-purity, high-density NiCrFe targets and customized services, supplemented by comprehensive technical support, to help customers achieve stable and efficient deposition results in high-temperature corrosion-resistant thin films and functional electronic materials applications.
Molecular formula: NiCrFe
Appearance: Metallic luster, silvery-white or gray target material, smooth surface
Crystal structure: Face-centered cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
