Copper indium sputtering targets are primarily used to prepare functional thin films with tunable composition, holding significant application value in optoelectronic and thin film materials research.
We can provide targets with various composition ratios and specifications to meet equipment and process requirements, supporting customized processing. Please contact us for solutions.
Uniform alloy composition distribution
High target density
Stable sputtering rate
Good film repeatability
Suitable for various vacuum sputtering systems
Optional bonding and backplane options
Facilitates precise control of thin film composition
Thin-film solar energy research: In the preparation of related absorber layers, this target is often used to deposit precursor metal thin films, providing a stable foundation for subsequent reaction processes.
Optoelectronic functional thin films: Uniform alloy thin films can be obtained through sputtering, suitable for research on optoelectronic performance modulation and structural optimization.
Semiconductor material development: This material can be used for process exploration of novel semiconductor systems, helping to verify the impact of different element ratios on electrical performance.
Q1: Can the copper-indium ratio be adjusted according to requirements?
A1: Yes, the target composition can be customized according to the specific application.
Q2: Is this target more suitable for DC or RF sputtering?
A2: It is generally compatible with multiple sputtering methods; the specific choice depends on the equipment configuration and process parameters.
Q3: Is the film composition stable during sputtering?
A3: Under reasonable process conditions, the target composition has good consistency, which helps to obtain stable films.
Q4: What precautions should be taken during the transportation and storage of the target?
A4: It is recommended to use vacuum or inert gas packaging to avoid long-term exposure to humid environments.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the stable preparation and quality control of alloy sputtering targets. With mature experience in composition design and processing, we can provide customers with reliable material consistency, flexible customization capabilities, and continuous and stable delivery support, helping scientific research and industrial projects advance efficiently.
Chemical Formula: CuIn
Molecular Weight: 178.37 g/mol
Appearance: Silver-gray to dark gray dense sputtering target
Crystal Structure: Tetragonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
