Copper Iodide sputtering targets are typical copper halide functional materials, primarily used for preparing transparent conductive films and novel optoelectronic functional films.
We can provide Copper Iodide sputtering targets in different sizes, shapes, and purities according to customer needs. Please contact us for customized solutions and technical support.
Stable stoichiometry
Good film composition consistency
Highly controllable sputtering process
Suitable for low-temperature deposition processes
Facilitates the achievement of high-transmittance films
Compatible with various sputtering systems
Transparent Conductive Films: In transparent electronic devices, cuprous iodide films can be used to construct functional layers that combine conductivity and visible light transmittance, suitable for flexible and novel display technologies.
Optoelectronic Device Research: This material has research value in terms of photoresponse characteristics and is often used for the verification of laboratory-grade optoelectronic devices and novel semiconductor structures.
Heterojunctions and Interface Layers: In multilayer thin film structures, cuprous iodide can serve as a functional interface layer, improving carrier transport behavior and interface stability.
Functional Coating Development: Cuprous iodide thin films prepared by sputtering are suitable for material screening and performance evaluation of novel functional coatings.
Q1: Is a cuprous iodide sputtering target suitable for DC or RF sputtering?
A1: Generally, RF sputtering is more suitable, helping to obtain thin films with more uniform composition and more stable adhesion.
Q2: Is the target prone to decomposition during sputtering?
A2: Under reasonable power and atmosphere control conditions, the target structure is stable, allowing for continuous deposition.
Q3: Are high substrate temperatures required for thin film preparation?
A3: This material supports deposition at relatively low substrate temperatures, making it suitable for temperature-sensitive substrate applications.
Q4: What precautions should be taken when storing the target?
A4: It is recommended to store it in a sealed container, avoiding humid environments to maintain the chemical stability of the material.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the stable preparation and application support of functional material sputtering targets. From raw material control to finished product testing, we have mature processes that provide customers with reliable material consistency, flexible customization capabilities, and long-term sustainable supply guarantees, facilitating the smooth progress of research and industrialization projects.
Chemical Formula: CuI
Molecular Weight: 190.45 g/mol
Appearance: White to pale yellow dense sputtering target
Density: 5.62 g/cm³
Melting Point: 588 °C
Boiling Point: 1,300 °C
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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