Copper aluminum oxide sputtering targets are high-purity metal oxide targets primarily used for the preparation of optoelectronic thin films, conductive films, and functional coatings to achieve uniform film layers and stable performance.
We offer copper aluminum oxide sputtering targets with different composition ratios, sizes, and purity levels. Custom processing and technical consultation are supported. Please contact us for solutions.
High purity
High compositional uniformity
Stable film deposition
Low impurities, chemically stable
Reliable conductivity and optical properties
Compatible with various sputtering equipment
Supports custom circular, square, and irregular shapes and bonding
Semiconductor and Electronic Device Thin Films: Used for the deposition of conductive and functional films in electronic devices, improving film uniformity and device performance.
Optoelectronic and Display Devices: Used in OLED, LCD, and touch displays to ensure uniform conductive films with high transparency.
Functional Coatings and Industrial Films: Suitable for the deposition of conductive, corrosion-resistant, or optical functional films, enhancing the added properties of industrial materials.
Q1: Is copper aluminum oxide (CA) sputtering suitable for DC or RF sputtering?
A1: CA is an insulating or semiconductor material, and RF sputtering is generally recommended to obtain stable films.
Q2: Does the composition ratio of the sputtering target affect deposition performance?
A2: Yes, different copper-aluminum ratios will affect the conductivity, optical properties, and deposition rate of the film. The appropriate ratio should be selected based on process requirements.
Q3: Can the size and shape of the sputtering target be customized to suit different equipment and process needs?
A3: Yes, we offer customized round, square, and irregularly shaped sputtering targets to match different sputtering equipment and process requirements.
Q4: What precautions should be taken when storing and handling the sputtering target?
A4: It is recommended to keep the target in a dry environment, avoid strong impacts, and prevent contact with water or acidic/alkaline substances to ensure the integrity of the target.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We focus on the research and development and supply of high-purity functional material sputtering targets, strictly controlling the uniformity of composition, batch stability and film deposition performance, providing reliable and traceable copper and aluminum oxide sputtering targets for scientific research, industry and optoelectronic devices.
Chemical Formula: CuAlO₂
Molecular Weight: 143.06 g/mol
Appearance: Red to brownish-red dense target material
Melting Point: Approximately 1,290 °C
Crystal Structure: Trigonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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