| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 300800ST001 | ZnO | 99.95% | Ø 25.4 mm x 3.175 mm | Inquire |
| 300800ST002 | ZnO | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 300800ST003 | ZnO | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 300800ST004 | ZnO | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 300800ST005 | ZnO | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 300800ST006 | ZnO | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 300800ST007 | ZnO | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 300800ST008 | ZnO | 99.95% | Ø 152.4 mm x 3.175 mm | Inquire |
| 300800ST009 | ZnO | 99.95% | Ø 152.4 mm x 6.35 mm | Inquire |
Zinc Oxide sputtering targets are widely used in high-tech fields such as optoelectronic devices, transparent conductive films, and solar cells, exhibiting excellent electrical and optical properties.
We offer high-purity ZnO sputtering targets suitable for various thin film deposition applications, helping you improve product performance and stability. Contact us for more technical support and customized services.
High-purity
Excellent electrical properties
Superior optical properties
Good transparency and conductivity
Stable sputtering deposition effect
High-efficiency thin film growth
Customizable sizes and shapes
Customizable bonding and backplanes
Optoelectronics: Used in optoelectronic devices to prepare transparent conductive films, widely used in touchscreens and optoelectronic devices.
Solar Cells: Used as a transparent conductive layer in solar cells, contributing to improved cell efficiency and stability.
Displays: Plays a crucial role in display manufacturing, especially in LCD and OLED technologies.
Sensors: Used in gas sensors and photosensors, improving their response speed and sensitivity.
Q1: Which industries use zinc oxide sputtering targets?
A1: Widely used in optoelectronics, solar energy, displays, and sensors, especially in transparent conductive films and solar cells.
Q2: What are the purity requirements for zinc oxide sputtering targets?
A2: We offer targets with 99.95% purity, meeting the requirements of high-end electronic and optoelectronic devices.
Q3: Can the size and shape of zinc oxide targets be customized?
A3: Yes, we can customize the size and shape of targets according to customer needs to adapt to the requirements of different equipment.
Q4: Are zinc oxide targets suitable for low-temperature deposition?
A4: Yes, they are suitable for low-temperature deposition processes, especially for low-temperature thin film deposition, ensuring the quality and stability of the film.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We offer high-purity, customized ZnO sputtering targets, along with comprehensive technical support and reports to help your projects succeed.
Molecular Formula: ZnO
Molecular Weight: 81.38 g/mol
Appearance: White, dense ceramic target with a smooth and uniform surface
Density: 5.61 g/cm³
Melting Point: 1,975 °C
Boiling Point: 2,360 °C
Crystal Structure: Hexagonal Wurtzite (P6₃mc)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
