Zirconium Silicide sputtering targets are metal silicide targets with high density, high temperature resistance, and stable film composition. They are commonly used in the fabrication of functional thin films, wear-resistant coatings, and microelectronic devices.
We offer a variety of ZrSi2 sputtering targets in different sizes, purities, and shapes, including circular targets, rectangular targets, large-size coating targets, and custom-made targets of special specifications. Targets can be adapted to sputtering chambers according to equipment models and support backplate bonding, surface grinding, and hole machining. Please feel free to contact us if needed.
High density and excellent film uniformity
Stable sputtering performance
Strong compositional consistency
Supports precision machining and backplate bonding
Suitable for long-term continuous coating
High-purity materials are available
Compatible with multiple equipment models
Wear-resistant coatings: Used for depositing thin films on wear-resistant surfaces of machining tools, molds, etc.
Electronic thin films: Suitable for the fabrication of conductive, barrier, or protective layers in microelectronic devices.
Structural Coatings: Protective coatings for high-temperature structural components, enhancing oxidation resistance.
Functional Membrane Materials: Used for the development of special functional membranes, reactive membranes, and composite membrane structures.
Q1: What is the packaging method for ZrSi₂ sputtering targets?
A1: Targets are packaged with an anti-static film, protected by a shockproof foam box and sealed bag, and further reinforced with a hard cardboard box to ensure the surface is not damaged or oxidized during transportation.
Q2: What processing services are supported?
A2: We offer processing services such as backplate bonding, dimensional fine-tuning, surface polishing, hole drilling, edge chamfering, and ultrasonic testing to meet the installation requirements of different coating equipment.
Q3: How should targets be stored correctly?
A3: They should be stored in a dry, clean environment, avoiding moisture, dust, and oil contamination. For long-term storage, it is recommended to seal them or place them in an inert gas environment to maintain target surface performance.
Q4: What are the purity and advantages of ZrSi2 sputtering targets?
A4: Target purity is available in various grades, featuring low impurity content, compact structure, and uniform composition, ensuring stable film composition, dense film layer, and stable sputtering rate.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the production and customization of metal silicide sputtering targets, possessing a complete manufacturing process and a rigorous quality system. We can reliably provide high-density ZrSi2 targets with strong compositional consistency. Multiple tests ensure stable sputtering performance and reliable film quality. We offer comprehensive services including fast delivery, customized processing, and technical consultation. Whether for scientific research or industrial production, we provide long-term, stable material support, making us a reliable sputtering target supplier.
Molecular Formula: ZrSi₂
Molecular Weight: 122.28 g/mol
Appearance: Silver-gray to light gray dense target with a smooth surface
Density: Approx. 6.3 g/cm³
Melting Point: Approx. 1,540 °C
Crystal Structure: Orthorhombic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
