| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4000ST001 | Zr | 99.5% (Zr + Hf) | Ø 130 mm x 20 mm | Inquire |
| 4000ST002 | Zr | 99.5% (Zr + Hf) | Ø 152.4 mm x 6.35 mm | Inquire |
| 4000ST003 | Zr | 99.95% (Zr + Hf) | Ø 50.8 mm x 3.175 mm | Inquire |
| 4000ST004 | Zr | 99.95% (Zr + Hf) | Ø 50.8 mm x 6.35 mm | Inquire |
| 4000ST005 | Zr | 99.95% (Zr + Hf) | Ø 75 mm x 3 mm | Inquire |
| 4000ST006 | Zr | 99.95% (Zr + Hf) | Ø 125 mm x 3 mm | Inquire |
| 4000ST007 | Zr | 99.95% (Zr + Hf) | Ø 125 mm x 6 mm | Inquire |
Zirconium metal sputtering targets are high-purity metallic materials engineered for precision thin-film deposition in advanced industries such as semiconductors, optics, and protective coatings. Produced with 99.95% purity Zirconium, these targets feature excellent density, uniform microstructure, and stable sputtering performance, enabling high-quality and highly consistent thin-film results.
We offer Zirconium sputtering targets in a wide range of dimensions and shapes—including planar, circular, and custom-machined targets. Bonding services and specialized packaging are available to ensure compatibility with different PVD systems. For any technical or application questions, our team provides full support and guidance.
High Purity
High-Density Target Body for Stable Sputtering
Smooth Surface Finish & Uniform Composition
Custom Sizes, Shapes & Backing Plate Bonding
Ideal for Semiconductor, Optical, and Protective Coating Applications
Semiconductors & Electronics：For barrier layers, conductive films, and thin-film components in microelectronic devices.
Optical Films：Used to produce reflective, protective, or corrosion-resistant optical coatings.
Aerospace & High-Temperature Components：Applied to form functional coatings on parts requiring oxidation and corrosion resistance.
Energy & Functional Materials：Useful in hydrogen-related materials, catalytic films, and advanced thin-film research.
Q1: What are the packaging options for Zirconium sputtering targets?
A1: Products are packaged using foam protection, vacuum sealing, or cleanroom-grade packaging depending on size and purity requirements. Custom packaging is also supported.
Q2: Do the targets support high-power sputtering conditions?
A2: Yes. With their high density and stable microstructure, Zirconium targets perform reliably under both DC and RF sputtering, even at high power levels.
Q3: How should Zirconium sputtering targets be stored?
A3: Store in a clean, dry, low-humidity environment, preferably in sealed packaging. Avoid corrosive environments and keep the surface free from contamination.
Q4: Can the target size and backing plate type be customized?
A4: Absolutely. We support custom machining, target bonding (Cu/Mo/SS), and full customization based on equipment specifications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Consistent Film Quality:High-density material ensures stable sputtering rates and uniform film deposition.
Flexible Customization:Dimensions, shapes, bonding styles, and purity grades can be tailored upon request.
Expert Technical Support:We provide guidance on material selection, sputtering parameters, and film application.
Quality Assurance:Each product is delivered with COA and MSDS, with third-party verification available.
Reliable Supply & Fast Delivery:Advanced production capacity ensures consistent availability and timely shipment.
Molecular Formula: Zr
Atomic Weight: 91.22 g/mol
Appearance: Silver-gray high-purity metallic target material, with a smooth surface and dense structure
Density: Approx. 6.52 g/cm³
Melting Point: Approx. 1,855 °C
Boiling Point: Approx. 4,377 °C
Crystal Structure: Hexagonal close-packed (hcp, α-Zr, room temperature phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
