Niobium Alumnium Alloy sputtering targets are high-purity, dense niobium-aluminum alloy targets specifically designed for physical vapor deposition (PVD) processes, enabling the formation of uniform, high-performance metal thin films. They are widely used in electronic devices, high-temperature alloy coatings, decorative films, and conductive layer deposition.
We offer a variety of NbAl sputtering targets with high purity, uniform density, and smooth surface finish. Sizes, thicknesses, and target shapes can be customized to customer requirements, suitable for scientific research and industrial production. Contact us.
High-purity NbAl alloy (99.9%)
Uniform and dense structure with high mechanical strength
Excellent film adhesion and high-temperature resistance
Smooth, non-porous surface
Customizable size, thickness, and target shape
Improved target utilization efficiency
Target bonding services available
Suitable for scientific research and industrial PVD applications
Electronic Device Thin Films: Used for the deposition of conductive thin films for microelectronic components, ensuring stable performance.
High-Temperature Alloy Coating: Surface protective coating used in high-temperature environments to improve material durability.
Decorative Film: Decorative coating applied to metal surfaces to improve gloss and adhesion.
Conductive Layer Deposition: Conductive films used in touchscreens, sensors, and transparent electronic devices.
Q1: What are the packaging options for NbAl sputtering targets?
A1: We offer moisture-proof sealed packaging, vacuum bag packaging, and rigid box packaging. Customization is available to meet customer needs, ensuring target quality during transportation and storage.
Q2: What processing can NbAl sputtering targets undergo?
A2: Cutting, drilling, polishing, and machining are possible to meet the needs of different PVD processes and scientific research experiments.
Q3: What are the storage requirements for NbAl sputtering targets?
A3: Store in a dry, cool, and well-ventilated environment, avoiding moisture, high temperatures, or chemical contamination. For long-term storage, inert gas or sealed packaging is recommended.
Q4: What are the purity and advantages of NbAl sputtering targets?
A4: Our NbAl sputtering targets have a purity of ≥99.9%, uniform density, strong thermal stability, and produce films with high adhesion, making them suitable for high-precision PVD applications in research and industry.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity NbAl alloy targets, reliable and stable performance
Customizable size, thickness, target shape, and surface treatment
Provide complete test reports and compliance certificates
Quick response to customer needs, supporting small-batch research and large-batch industrial supply
Professional technical team provides thin film deposition and process guidance
Years of export experience, safe and reliable transportation
Chemical Formula: NbAl
Molecular Weight: 119.89 g/mol
Appearance: Silver-gray dense target material
Density: ≈ 6.5–6.7 g/cm³ (depending on density)
Crystal Structure: Body-centered cubic structure (NbAl B2 phase, CsCl type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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