| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4100ST001 | Nb | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 4100ST002 | Nb | 99.9% | Ø 76.2 mm x 3.175 mm | Inquire |
| 4100ST003 | Nb | 99.9% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4100ST004 | Nb | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 4100ST005 | Nb | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 4100ST006 | Nb | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 4100ST007 | Nb | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4100ST008 | Nb | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 4100ST009 | Nb | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
| 4100ST010 | Nb | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 4100ST011 | Nb | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 4100ST012 | Nb | 99.99% | Ø 76.2 mm x 3.175 mm | Inquire |
| 4100ST013 | Nb | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4100ST014 | Nb | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
| 4100ST015 | Nb | 99.99% | Ø 203.2 mm x 6.35 mm | Inquire |
Niobium metal sputtering targets are high-purity, dense metallic materials specifically designed for physical vapor deposition (PVD) processes, ensuring uniform film deposition and high adhesion. They are widely used in thin film deposition for semiconductor devices, optical coatings, touch screens, and electronic components.
We offer various specifications of niobium metal sputtering targets, featuring high purity and uniform density. Diameter, thickness, and shape can be customized to meet customer needs, suitable for both scientific research and industrial production. For pricing or customization options, please contact us.
High-purity niobium (99.99%)
Dense and uniform, high mechanical strength
High electrical conductivity and thermal stability
Smooth surface, free of pores
Customizable size, thickness, and shape
Target bonding services available
Suitable for various PVD sputtering processes
Provides solutions for both scientific research and industrial applications
Semiconductor Devices: Used to prepare high-performance semiconductor thin films, improving device reliability.
Optical Coating: Used for thin-film deposition in optical lenses and displays, ensuring uniformity and adhesion of the film layer.
Touchscreen Materials: Used in the manufacture of conductive thin films for touchscreens, improving response speed and sensitivity.
Electronic Components: Used for thin-film deposition in electronic devices, ensuring high conductivity and durability.
Q1: What are the packaging methods for niobium sputtering targets?
A1: We provide moisture-proof sealed packaging, vacuum bag packaging, and rigid cardboard box packaging to ensure that the target material is not contaminated or oxidized during transportation and storage.
Q2: What processing can niobium sputtering targets undergo?
A2: They can be cut, drilled, surface polished, and machined to meet different PVD processes and research needs.
Q3: What are the storage requirements for niobium sputtering targets?
A3: Please store in a dry, cool, and ventilated environment, avoiding moisture and high temperatures. For long-term storage, it is recommended to use inert gas or sealed packaging.
Q4: What are the advantages and purity of niobium targets?
A4: Our niobium targets boast a purity of up to 99.99%, uniform density, and strong thermal stability, ensuring uniform film deposition and high adhesion, making them suitable for high-precision scientific research and industrial applications.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity niobium targets, stable and reliable performance
Customization of size, shape, and thickness available
Complete testing reports and compliance certificates provided
Rapid response to customer needs, supporting small and large batch orders
Professional technical team provides PVD application advice
Years of export experience, safe and reliable transportation
Chemical Formula: Nb
Atomic Weight: 92.906 g/mol
Appearance: Silver-gray metallic target, commonly round or square; metallic luster
Density: 8.57 g/cm³ (theoretical density)
Melting Point: 2477 ℃
Boiling Point: 4744 ℃
Crystal Structure: Body-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us