Molybdenum Tantalum Alloy sputtering targets are corrosion-resistant, high-melting-point functional materials formed from molybdenum and tantalum through high-temperature metallurgical processing. They possess excellent mechanical strength, thermal stability, and chemical inertness. Their deposited thin films exhibit outstanding performance in semiconductor processes, microelectronic interconnects, anti-diffusion coatings, and high-temperature thin-film components, making them crucial materials for advanced chip manufacturing and high-end coating industries.
We can provide MoTa sputtering targets in various tantalum content ratios, purity grades, and sizes to meet customer needs, including circular targets, rectangular targets, segmented targets, and composite backplane targets. Please contact us anytime for detailed pricing information.
High melting point, strong thermal shock resistance
Stable thin film adhesion performance
Tantalum content can be precisely adjusted according to requirements
High-density material, low particle shedding
Excellent anti-diffusion and corrosion resistance
Compatible with various magnetron sputtering systems
Used for barrier layer deposition in semiconductor interconnect structures.
Applications include high-temperature structural thin films and corrosion-resistant protective layers.
It is used as a conductive or functional thin film material in microelectronics processing.
It is used for high-performance thin film preparation in industrial coating equipment.
Q1: What is the packaging method for MoTa sputtering targets?
A1: Each sputtering target is vacuum-sealed with shock-resistant material, and the outer layer is packaged in a pressure-resistant hard box to ensure cleanliness, safety, and no damage during transportation.
Q2: Can the sputtering targets be customized? For example, in terms of size, bonding, or surface treatment?
A2: Yes, we provide a full range of processing services, including precision machining, backplane bonding, surface polishing, and custom shapes to match customers’ equipment and process requirements.
Q3: How should MoTa alloy sputtering targets be stored?
A3: It is recommended to store them in a dry, sealed environment, avoiding direct exposure to moisture or contaminants to maintain material performance stability and extend service life.
Q4: How do you guarantee the purity and material quality of your products?
A4: We produce sputtering targets using high-purity raw materials, rigorous sintering processes, and a full-inspection quality control process. We can provide purity analysis, structural testing, and batch tracking reports to ensure the consistency of each batch of materials.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
We specialize in the R&D and production of molybdenum-based, tantalum-based, and refractory metal sputtering targets. We possess advanced powder metallurgy technology and precision machining capabilities, enabling us to consistently provide high-density, high-purity, and low-defect MoTa alloy sputtering targets.
Our products have long served semiconductor, optoelectronic, precision coating, and research institutions worldwide, earning widespread recognition for our reliable quality, flexible customization capabilities, fast delivery, and professional technical support. Choosing us means choosing a stable supply chain, high-performance materials, and a trustworthy technical partner.
Chemical formula: MoTa
Appearance: Dense silver-gray metallic disk or rectangular target with a smooth surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
