Molybdenum Silicide sputtering targets are high-temperature ceramic corrosion-resistant materials formed by the combination of molybdenum and silicon. They possess excellent high-temperature stability, electrical conductivity, and oxidation resistance. Thin films prepared from these targets are commonly used in microelectronic devices, hard coatings, barrier layers, and optoelectronic functional films, making them one of the most important target materials in semiconductor and high-performance thin film engineering.
We can produce MoSi2 sputtering targets of various purities, sizes, shapes, and densities according to customer needs. We also provide surface polishing, vacuum bonding, specific composition ratio adjustment, and batch customization services to match customer process requirements. Please feel free to contact us.
Strong high-temperature oxidation stability
Uniform film deposition with few particles
Supports precision machining and custom sizes
Low impurity content and stable electrical properties
Good corrosion resistance and electrical conductivity
Compatible with various magnetron sputtering equipment
Used for barrier layer and conductive film deposition in the semiconductor industry.
Applications include the preparation of hard protective layers and wear-resistant coatings.
It serves as a functional thin film material in optoelectronic components.
It is used in research related to high-temperature electronic and structural thin films.
Q1: How are MoSi2 targets packaged for transportation?
A1: The product is vacuum-sealed and packaged with a pressure-resistant cushioning layer and a rigid outer box to ensure no contamination or damage during transportation.
Q2: Do you support target processing, such as special sizes or surface treatments?
A2: Yes, we can provide precision machining, polishing, bonding backplanes, and custom non-standard shapes to meet various application needs.
Q3: How should targets be stored to maintain performance stability?
A3: It is recommended to store them in a dry, sealed environment, avoiding contact with moisture and corrosive substances to maintain the surface cleanliness and physical property stability of the target.
Q4: How do you guarantee product purity? Can you provide relevant testing?
A4: All sputtering targets are manufactured using high-purity raw materials and tested using methods such as XRF, ICP, and XRD. Complete material analysis reports and quality certificates are available.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
We have many years of experience in producing compound and intermetallic compound sputtering targets, equipped with advanced powder metallurgy equipment and a rigorous quality management system. We can continuously supply high-purity, high-density, and highly uniform MoSi₂ sputtering targets. We provide our clients with flexible customization capabilities, technical support, fast delivery, and a stable supply chain service, making us a trustworthy long-term partner for research institutions, semiconductor companies, and the thin film manufacturing industry.
Chemical Formula: MoSi2
Molecular Weight: 150.92 g/mol
Appearance: Silver-gray dense disk-shaped or rectangular target material with a smooth surface
Density: 6.24 g/cm³
Melting Point: ≈ 2030 °C
Crystal Structure: Tetragonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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