Thulium oxide sputtering targets are high-performance rare earth oxide materials designed for advanced thin film deposition processes. With a purity of up to 99.99%, they have excellent chemical stability and high insulation properties and are widely used in optoelectronic devices, storage materials, optical coatings, and other fields. High-purity thulium oxide sputtering targets maintain good thermal stability under high temperature and high vacuum conditions, making them suitable for demanding processes.
We offer thulium oxide sputtering targets in a variety of shapes and sizes, including round, rectangular, and special-shaped targets, and can provide customized services based on customer needs. At the same time, we provide comprehensive after-sales support services to ensure that you have no worries in terms of selection, use, process matching, etc.
Purity: 99.99%
Dense structure: ensure uniform and stable film deposition
High insulation and thermal stability: suitable for high-performance dielectric films and functional layers
Customizable size and shape: meet the compatibility requirements of various PVD equipment
Compatible with mainstream deposition systems: adapt to equipment such as magnetron sputtering and electron beam evaporation
Binding service: target backplane processing and binding services can be provided
Semiconductor devices: as high-k dielectric materials, optimize the capacitance and leakage performance of devices
Optical coating: used for high-end optical components such as filters, infrared windows, and high refractive index coatings
Information storage: used for new optical storage and magneto-optical storage thin film materials
Laser devices and phosphor materials: improve excitation efficiency in rare earth doping systems
We provide a complete analysis report (COA), material safety data sheet (MSDS) and compliance documents (such as RoHS, REACH) for each batch. Support third-party testing to ensure that product quality meets international standards.
Molecular formula: Tm₂O₃
Molecular weight: 385.87 g/mol
Appearance: White to light green block target
Density: 8.6 ± 0.1 g/cm³ (measured value, relative density ≥99%)
Melting point: 2341 ± 10°C
Crystal structure: Cubic system (Ia-3 space group)
Binding method: Copper/Molybdenum backplane
Signal Word:
Warning
Hazard Statements:
H315 Causes skin irritation.
H319 Causes serious eye irritation.
H335: May cause respiratory irritation
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
