ULPMAT

Palladium Nickel Alloy

Chemical Name:
Palladium Nickel Alloy
Formula:
PdNi
Product No.:
462800
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
462800ST001 PdNi (90:10 wt%) 99.95% Ø 50.8 mm x 6.35 mm Inquire
Product ID
462800ST001
Formula
PdNi (90:10 wt%)
Purity
99.95%
Dimension
Ø 50.8 mm x 6.35 mm

Palladium Nickel Alloy Sputtering Target Overview

Palladium Nickel Alloy sputtering targets are functional alloy materials with palladium and nickel as the main components. They possess excellent adhesion control, dense thin film deposition structures, and good corrosion resistance. This material is widely used in microelectronic devices, electrical contact films, magnetic materials, and chemical catalysis. Suitable for various vacuum deposition systems, it achieves stable and high-efficiency thin film preparation.

We offer sputtering targets with various Pd/Ni ratios and support customization of different structures such as circular, rectangular, curved targets, bonded targets, and backplate targets. Contact us for your customized solution.

Product Highlights

Uniform composition and high target density
Excellent film stability
Low impurity levels
Supports high-power sputtering
Mature backplate bonding process
Excellent batch consistency
Smooth surface and easy installation
Custom formulations available to meet customer processes

Applications of Palladium Nickel Alloy Sputtering Target

Electronic Thin Film Preparation: Used for high-requirement conductive or resistive thin film deposition.
Multilayer Structure Devices: Used in structured thin film design for sensors, functional coatings, etc.
Electrical Contact Materials: Improves the corrosion resistance and stability of contacts.
Catalytic Thin Films: Used for the preparation of catalytic layers in chemical reactions and energy systems.

FAQs

Q1: What packaging do you use for your sputtering targets?
A: All targets are vacuum-sealed and supplemented with shockproof outer boxes with foam cushioning to ensure they are not contaminated or damaged during transportation.

Q2: Do sputtering targets require special conditions during transportation?
A: No special cold chain transportation is required, but we will add moisture-proof bags and shock-resistant protection for international shipments to ensure they arrive in good condition.

Q3: What are the main advantages of Pd-Ni sputtering targets?
A: Stable alloy composition, good film adhesion, strong corrosion resistance, and suitable for various PVD systems, maintaining uniform deposition even during high-power sputtering.

Q4: How should targets be stored? A: It is recommended to store in a dry, clean, and airtight environment, avoiding moisture and dust. Unused targets can be stored in their original packaging to extend their lifespan.

Reports

Each batch is supplied with:

Certificate of Analysis (COA)

Technical Data Sheet (TDS)

Material Safety Data Sheet (MSDS)

Third-party testing reports available upon request

Why Choose Us?

We have many years of experience in rare and precious metal materials and thin film technology, providing high-purity, highly stable Palladium Nickel Alloy sputtering targets suitable for various PVD processes from R&D to mass production. We employ advanced sintering technology, vacuum bonding processes, and rigorous quality control to ensure that every batch of targets possesses excellent density and compositional consistency. With international supply capabilities, rapid technical support, and flexible customization services, we provide highly reliable thin film material solutions to customers worldwide.

Chemical formula: PdNi
Appearance: Silvery-white or grayish-white metallic disk or rectangular target
Crystal structure: Face-centered cubic (FCC)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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